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	Thermodynamics of amorphous SiN(O)H dielectric films synthesized by plasma-enhanced chemical vapor deposition
	Chen, Jiewei; Niu, Min; Calvin, Jason; Asplund, Megan; King, Sean W.; Woodfield, Brian F.; Navrotsky, Alexandra
刊名	JOURNAL OF THE AMERICAN CERAMIC SOCIETY
	2018
卷号	101页码:2017-+
关键词	formation enthalpy amorphous low-k SiN(O)H films thermodynamic stability
ISSN号	0002-7820
URL标识	查看原文
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/2918128
专题	西安交通大学
推荐引用方式 GB/T 7714	Chen, Jiewei,Niu, Min,Calvin, Jason,et al. Thermodynamics of amorphous SiN(O)H dielectric films synthesized by plasma-enhanced chemical vapor deposition[J]. JOURNAL OF THE AMERICAN CERAMIC SOCIETY,2018,101:2017-+.
APA	Chen, Jiewei.,Niu, Min.,Calvin, Jason.,Asplund, Megan.,King, Sean W..,...&Navrotsky, Alexandra.(2018).Thermodynamics of amorphous SiN(O)H dielectric films synthesized by plasma-enhanced chemical vapor deposition.JOURNAL OF THE AMERICAN CERAMIC SOCIETY,101,2017-+.
MLA	Chen, Jiewei,et al."Thermodynamics of amorphous SiN(O)H dielectric films synthesized by plasma-enhanced chemical vapor deposition".JOURNAL OF THE AMERICAN CERAMIC SOCIETY 101(2018):2017-+.

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