Superlow friction and oxidation analysis of hydrogenated amorphous silicon films under high temperature | |
Zeng, Qunfeng; Chen, Tong | |
刊名 | JOURNAL OF NON-CRYSTALLINE SOLIDS
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2018 | |
卷号 | 493页码:73-81 |
关键词 | Oxidation Thermal stability Hydrogenated amorphous silicon films Superlow friction Molecular dynaimics |
ISSN号 | 0022-3093 |
URL标识 | 查看原文 |
内容类型 | 期刊论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/2913673 |
专题 | 西安交通大学 |
推荐引用方式 GB/T 7714 | Zeng, Qunfeng,Chen, Tong. Superlow friction and oxidation analysis of hydrogenated amorphous silicon films under high temperature[J]. JOURNAL OF NON-CRYSTALLINE SOLIDS,2018,493:73-81. |
APA | Zeng, Qunfeng,&Chen, Tong.(2018).Superlow friction and oxidation analysis of hydrogenated amorphous silicon films under high temperature.JOURNAL OF NON-CRYSTALLINE SOLIDS,493,73-81. |
MLA | Zeng, Qunfeng,et al."Superlow friction and oxidation analysis of hydrogenated amorphous silicon films under high temperature".JOURNAL OF NON-CRYSTALLINE SOLIDS 493(2018):73-81. |
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