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Lowering Band Gap of an Electroactive Metal-Organic Framework via Complementary Guest Intercalation
Guo, Zhiyong; Panda, Dillip K.; Gordillo, Monica A.; Khatun, Amina; Wu, Hui; Zhou, Wei; Saha, Sourav
刊名ACS APPLIED MATERIALS & INTERFACES
2017
卷号9页码:CP35-CP39
关键词conductivity metal-organic frameworks band gap naphthalene diimides pi-donor/acceptor interaction
ISSN号1944-8244
URL标识查看原文
内容类型期刊论文
URI标识http://www.corc.org.cn/handle/1471x/2893738
专题福州大学
推荐引用方式
GB/T 7714
Guo, Zhiyong,Panda, Dillip K.,Gordillo, Monica A.,et al. Lowering Band Gap of an Electroactive Metal-Organic Framework via Complementary Guest Intercalation[J]. ACS APPLIED MATERIALS & INTERFACES,2017,9:CP35-CP39.
APA Guo, Zhiyong.,Panda, Dillip K..,Gordillo, Monica A..,Khatun, Amina.,Wu, Hui.,...&Saha, Sourav.(2017).Lowering Band Gap of an Electroactive Metal-Organic Framework via Complementary Guest Intercalation.ACS APPLIED MATERIALS & INTERFACES,9,CP35-CP39.
MLA Guo, Zhiyong,et al."Lowering Band Gap of an Electroactive Metal-Organic Framework via Complementary Guest Intercalation".ACS APPLIED MATERIALS & INTERFACES 9(2017):CP35-CP39.
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