Atomic layer deposition assisted pattern transfer technology for ultra-thin block copolymer films

	Atomic layer deposition assisted pattern transfer technology for ultra-thin block copolymer films
	Chen WH(陈文辉); Luo J(罗军); Meng LK(孟令款); Li JJ(李俊杰); Xiang JJ(项金娟); Li JF(李俊峰); Wang WW(王文武); Chen DP(陈大鹏); Ye TC(叶甜春)
刊名	Thin Solid Films
	2016-08-31
文献子类	期刊论文
内容类型	期刊论文
源URL	[http://159.226.55.106/handle/172511/16215]
专题	微电子研究所_集成电路先导工艺研发中心
作者单位	中国科学院微电子研究所
推荐引用方式 GB/T 7714	Chen WH,Luo J,Meng LK,et al. Atomic layer deposition assisted pattern transfer technology for ultra-thin block copolymer films[J]. Thin Solid Films,2016.
APA	Chen WH.,Luo J.,Meng LK.,Li JJ.,Xiang JJ.,...&Ye TC.(2016).Atomic layer deposition assisted pattern transfer technology for ultra-thin block copolymer films.Thin Solid Films.
MLA	Chen WH,et al."Atomic layer deposition assisted pattern transfer technology for ultra-thin block copolymer films".Thin Solid Films (2016).