Investigation of TiAlC by Atomic Layer Deposition as N Type

	Investigation of TiAlC by Atomic Layer Deposition as N Type
	Cui HS(崔虎山); Xiang JJ(项金娟); Li TT(李亭亭); Zhang YB(张严波); Wang XL(王晓磊); Li JF(李俊峰); Wang WW(王文武); Gao JF(高建峰); Zhao C(赵超)
刊名	ECS Journal of Solid State Science and Technology
	2015-10-20
语种	英语
公开日期	2016-05-31
内容类型	期刊论文
源URL	[http://10.10.10.126/handle/311049/15061]
专题	微电子研究所_集成电路先导工艺研发中心
作者单位	中国科学院微电子研究所
推荐引用方式 GB/T 7714	Cui HS,Xiang JJ,Li TT,et al. Investigation of TiAlC by Atomic Layer Deposition as N Type[J]. ECS Journal of Solid State Science and Technology,2015.
APA	Cui HS.,Xiang JJ.,Li TT.,Zhang YB.,Wang XL.,...&Zhao C.(2015).Investigation of TiAlC by Atomic Layer Deposition as N Type.ECS Journal of Solid State Science and Technology.
MLA	Cui HS,et al."Investigation of TiAlC by Atomic Layer Deposition as N Type".ECS Journal of Solid State Science and Technology (2015).