In-Situ Nitrogen Doping of the TiO2 Photocatalyst Deposited byPEALD for Visible Light Activity

	In-Situ Nitrogen Doping of the TiO2 Photocatalyst Deposited byPEALD for Visible Light Activity
	Li CB(李超波); Chen B(陈波); Wan J(万军); Rao ZP(饶志鹏); Liu J(刘键); Huang CQ(黄成强); Xia Y(夏洋)
刊名	Plasma Science and Technology
	2014-05-01
公开日期	2015-04-22
内容类型	期刊论文
源URL	[http://10.10.10.126/handle/311049/12682]
专题	微电子研究所_微电子仪器设备研发中心
通讯作者	Xia Y(夏洋)
推荐引用方式 GB/T 7714	Li CB,Chen B,Wan J,et al. In-Situ Nitrogen Doping of the TiO2 Photocatalyst Deposited byPEALD for Visible Light Activity[J]. Plasma Science and Technology,2014.
APA	李超波.,陈波.,万军.,饶志鹏.,刘键.,...&夏洋.(2014).In-Situ Nitrogen Doping of the TiO2 Photocatalyst Deposited byPEALD for Visible Light Activity.Plasma Science and Technology.
MLA	李超波,et al."In-Situ Nitrogen Doping of the TiO2 Photocatalyst Deposited byPEALD for Visible Light Activity".Plasma Science and Technology (2014).