A method to restrain the charging effect on insulating substrate in high energy electron beam lithography | |
Jing YP(景玉鹏); Chen BQ(陈宝钦); Yu MY(于明岩); Zhao SR(赵士瑞); Shi YB(施云波) | |
刊名 | 半导体学报 |
2014-12-01 | |
公开日期 | 2015-04-22 |
内容类型 | 期刊论文 |
源URL | [http://10.10.10.126/handle/311049/12680] |
专题 | 微电子研究所_微电子仪器设备研发中心 |
通讯作者 | Yu MY(于明岩) |
推荐引用方式 GB/T 7714 | Jing YP,Chen BQ,Yu MY,et al. A method to restrain the charging effect on insulating substrate in high energy electron beam lithography[J]. 半导体学报,2014. |
APA | 景玉鹏,陈宝钦,于明岩,赵士瑞,&施云波.(2014).A method to restrain the charging effect on insulating substrate in high energy electron beam lithography.半导体学报. |
MLA | 景玉鹏,et al."A method to restrain the charging effect on insulating substrate in high energy electron beam lithography".半导体学报 (2014). |
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