Thermal Annealing Behavior of Helium in Ti Films Deposited by Magnetron Sputtering

doi:10.1088/0256-307X/29/1/012501

	Thermal Annealing Behavior of Helium in Ti Films Deposited by Magnetron Sputtering
	Zhang Lei; He Zhi-Jiang; Liu Chao-Zhuo; Wang Xu-Fei; Shi Li-Qun
刊名	CHINESE PHYSICS LETTERS
	2012
卷号	29
ISSN号	0256-307X
DOI	10.1088/0256-307X/29/1/012501
文献子类	Article
英文摘要	Helium contents of up to 30at.% are prepared in sputter-deposited Ti films. Isochronal annealing behaviors of helium including the depth profiles and the evolution of helium bubbles in the films at different temperatures are examined by ion beam analysis including Rutherford backscattering spectrometry (RBS) and elastic recoil detection analysis (ERDA), as well as thermal helium desorption spectroscopy (THDS). It is found that the energy spreading induced by structural inhomogeneities in the spectra of RBS and ERDA as well as the increment in the width of spectra occurs, which corresponds to the change of stopping cross-section of helium atoms in the Ti film due to the change of physical-state of helium in the evolution of helium bubble. The ion beam analysis on the helium evolution is consistent with the THDS measurement. Ion beam technique opens interesting possibilities in the characterizing on the growth of helium bubbles.
WOS关键词	ION-IMPLANTATION ; HYDROGEN ; ALUMINUM ; BUBBLES ; ENERGY ; ZR
语种	英语
出版者	IOP PUBLISHING LTD
WOS记录号	WOS:000300309500019
内容类型	期刊论文
源URL	[http://119.78.100.186/handle/113462/48677]
专题	中国科学院近代物理研究所
通讯作者	Shi Li-Qun
作者单位	Fudan Univ, Inst Modern Phys, Appl Ion Beam Phys Lab, Shanghai 200433, Peoples R China
推荐引用方式 GB/T 7714	Zhang Lei,He Zhi-Jiang,Liu Chao-Zhuo,et al. Thermal Annealing Behavior of Helium in Ti Films Deposited by Magnetron Sputtering[J]. CHINESE PHYSICS LETTERS,2012,29.
APA	Zhang Lei,He Zhi-Jiang,Liu Chao-Zhuo,Wang Xu-Fei,&Shi Li-Qun.(2012).Thermal Annealing Behavior of Helium in Ti Films Deposited by Magnetron Sputtering.CHINESE PHYSICS LETTERS,29.
MLA	Zhang Lei,et al."Thermal Annealing Behavior of Helium in Ti Films Deposited by Magnetron Sputtering".CHINESE PHYSICS LETTERS 29(2012).