EPITAXIALLY GROWN BETA-SIC ON SI IN THE CH4-H-2 SYSTEM BY HOT-FILAMENT CHEMICAL-VAPOR-DEPOSITION | |
SUN, Z; SUN, Y; WANG, X; ZHENG, Z | |
刊名 | MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
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1995-11-01 | |
卷号 | 34页码:L13-L16 |
关键词 | EPITAXY OF THIN FILMS CHEMICAL VAPOR DEPOSITION SILICON SILICON CARBIDE |
ISSN号 | 0921-5107 |
英文摘要 | beta-SiC thin films were deposited on silicon substrates by hot filament chemical vapour deposition from methane diluted with hydrogen. Under deposition conditions with a CH4:H-2 ratio of 0.5%, filament temperature of 2200-2400 degrees C, gas pressure of 10 kPa and distance between filament and substrate of 2-8 mm, if the substrate temperature is between 700 and 1000 degrees C, diamond films were deposited, while if the temperature is between 1000 and 1200 degrees C, only silicon carbide (beta-SiC) films were heteroepitaxially deposited. The morphology and structure of the films were characterized by scanning electron microscopy, X-ray diffraction and Raman spectroscopy, and a model of SiC growth is proposed. |
WOS关键词 | ASSISTED DIAMOND GROWTH ; LOW-PRESSURE ; THIN-FILMS ; DEFECT STRUCTURES ; NUCLEATION ; SUBSTRATE ; SILICON ; CVD |
WOS研究方向 | Materials Science ; Physics |
语种 | 英语 |
出版者 | ELSEVIER SCIENCE SA LAUSANNE |
WOS记录号 | WOS:A1995TG51000023 |
内容类型 | 期刊论文 |
源URL | [http://119.78.100.186/handle/113462/46574] ![]() |
专题 | 中国科学院近代物理研究所 |
通讯作者 | SUN, Z |
作者单位 | 1.SHANGHAI JIAO TONG UNIV,STATE KEY LAB MET MATRIX COMPOSITE MAT,SHANGHAI 200030,PEOPLES R CHINA 2.CHINESE ACAD SCI,LANZHOU INST CHEM PHYS,DEPT MODERN PHYS,LANZHOU 730000,PEOPLES R CHINA |
推荐引用方式 GB/T 7714 | SUN, Z,SUN, Y,WANG, X,et al. EPITAXIALLY GROWN BETA-SIC ON SI IN THE CH4-H-2 SYSTEM BY HOT-FILAMENT CHEMICAL-VAPOR-DEPOSITION[J]. MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY,1995,34:L13-L16. |
APA | SUN, Z,SUN, Y,WANG, X,&ZHENG, Z.(1995).EPITAXIALLY GROWN BETA-SIC ON SI IN THE CH4-H-2 SYSTEM BY HOT-FILAMENT CHEMICAL-VAPOR-DEPOSITION.MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY,34,L13-L16. |
MLA | SUN, Z,et al."EPITAXIALLY GROWN BETA-SIC ON SI IN THE CH4-H-2 SYSTEM BY HOT-FILAMENT CHEMICAL-VAPOR-DEPOSITION".MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY 34(1995):L13-L16. |
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