Investigation of the hydrogenation properties of Zr films under unclean plasma conditions

doi:10.1116/1.1506174

	Investigation of the hydrogenation properties of Zr films under unclean plasma conditions
	Shi, LQ ; Yan, GQ ; Zhou, JY ; Luo, SZ ; Peng, SM ; Ding, W ; Long, XG
刊名	JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
	2002-11-01
卷号	20 页码:1840-1845
ISSN号	0734-2101
DOI	10.1116/1.1506174
英文摘要	By the means of non-Rutherford backscattering spectroscopy and elastic recoil detection analysis, the plasma hydrogenation of Zr films with and without a Ni overlayer were investigated. Close to the theoretical maximum hydrogen storage capacity (H/Zr=2) was attained when the sample was exposed to plasma with relative low contamination and a hydrogen pressure of similar to2 Pa and a substrate temperature of 393 K for 10 min. This reaction rate is much higher than obtained for gas hydrogenation. In an unclean plasma condition, the absorption of hydrogen is retarded by C and O contamination occurring on the sample surface. Though the oxide layer does not act as an efficient permeation barrier to atomic hydrogen, the maximum equilibrium hydrogen content dropped drastically with increasing contamination. In contrast to theoretical prediction, the hydrogen capacity for Ti is lower than Zr due to sample contamination. Also, the influence of the Ni overlayer on the plasma hydrogenation is discussed. (C) 2002 American Vacuum Society.
WOS关键词	ABSORPTION ; KINETICS ; RELEASE ; METALS ; LAYER ; TI
WOS研究方向	Materials Science ; Physics
语种	英语
出版者	A V S AMER INST PHYSICS
WOS记录号	WOS:000179441700002
内容类型	期刊论文
源URL	[http://119.78.100.186/handle/113462/38057]
专题	中国科学院近代物理研究所
通讯作者	Shi, LQ
作者单位	1.Fudan Univ, Inst Modern Phys, Appl Ion Beam Phys Lab, Shanghai 200433, Peoples R China 2.China Acad Engn Phys, Inst Nucl & Chem, ChengDu 610003, Peoples R China
推荐引用方式 GB/T 7714	Shi, LQ,Yan, GQ,Zhou, JY,et al. Investigation of the hydrogenation properties of Zr films under unclean plasma conditions[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,2002,20:1840-1845.
APA	Shi, LQ.,Yan, GQ.,Zhou, JY.,Luo, SZ.,Peng, SM.,...&Long, XG.(2002).Investigation of the hydrogenation properties of Zr films under unclean plasma conditions.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,20,1840-1845.
MLA	Shi, LQ,et al."Investigation of the hydrogenation properties of Zr films under unclean plasma conditions".JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS 20(2002):1840-1845.