Investigation of the hydrogenation properties of Zr films under unclean plasma conditions | |
Shi, LQ; Yan, GQ; Zhou, JY; Luo, SZ; Peng, SM; Ding, W; Long, XG | |
刊名 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
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2002-11-01 | |
卷号 | 20页码:1840-1845 |
ISSN号 | 0734-2101 |
DOI | 10.1116/1.1506174 |
英文摘要 | By the means of non-Rutherford backscattering spectroscopy and elastic recoil detection analysis, the plasma hydrogenation of Zr films with and without a Ni overlayer were investigated. Close to the theoretical maximum hydrogen storage capacity (H/Zr=2) was attained when the sample was exposed to plasma with relative low contamination and a hydrogen pressure of similar to2 Pa and a substrate temperature of 393 K for 10 min. This reaction rate is much higher than obtained for gas hydrogenation. In an unclean plasma condition, the absorption of hydrogen is retarded by C and O contamination occurring on the sample surface. Though the oxide layer does not act as an efficient permeation barrier to atomic hydrogen, the maximum equilibrium hydrogen content dropped drastically with increasing contamination. In contrast to theoretical prediction, the hydrogen capacity for Ti is lower than Zr due to sample contamination. Also, the influence of the Ni overlayer on the plasma hydrogenation is discussed. (C) 2002 American Vacuum Society. |
WOS关键词 | ABSORPTION ; KINETICS ; RELEASE ; METALS ; LAYER ; TI |
WOS研究方向 | Materials Science ; Physics |
语种 | 英语 |
出版者 | A V S AMER INST PHYSICS |
WOS记录号 | WOS:000179441700002 |
内容类型 | 期刊论文 |
源URL | [http://119.78.100.186/handle/113462/38057] ![]() |
专题 | 中国科学院近代物理研究所 |
通讯作者 | Shi, LQ |
作者单位 | 1.Fudan Univ, Inst Modern Phys, Appl Ion Beam Phys Lab, Shanghai 200433, Peoples R China 2.China Acad Engn Phys, Inst Nucl & Chem, ChengDu 610003, Peoples R China |
推荐引用方式 GB/T 7714 | Shi, LQ,Yan, GQ,Zhou, JY,et al. Investigation of the hydrogenation properties of Zr films under unclean plasma conditions[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,2002,20:1840-1845. |
APA | Shi, LQ.,Yan, GQ.,Zhou, JY.,Luo, SZ.,Peng, SM.,...&Long, XG.(2002).Investigation of the hydrogenation properties of Zr films under unclean plasma conditions.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,20,1840-1845. |
MLA | Shi, LQ,et al."Investigation of the hydrogenation properties of Zr films under unclean plasma conditions".JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS 20(2002):1840-1845. |
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