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A Modified Single Pulse Method for Transient Thermal Impedance (TTI) Measurement of VDMOSFET Relates Gate Bias to the TTI Results
Tang, Yankun
刊名JOURNAL OF SEMICONDUCTOR TECHNOLOGY AND SCIENCE
2018
卷号18页码:383-391
关键词Thermal character MOSFET transient thermal impedance gate bias pulse
ISSN号1598-1657
URL标识查看原文
内容类型期刊论文
URI标识http://www.corc.org.cn/handle/1471x/2832035
专题西安交通大学
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Tang, Yankun. A Modified Single Pulse Method for Transient Thermal Impedance (TTI) Measurement of VDMOSFET Relates Gate Bias to the TTI Results[J]. JOURNAL OF SEMICONDUCTOR TECHNOLOGY AND SCIENCE,2018,18:383-391.
APA Tang, Yankun.(2018).A Modified Single Pulse Method for Transient Thermal Impedance (TTI) Measurement of VDMOSFET Relates Gate Bias to the TTI Results.JOURNAL OF SEMICONDUCTOR TECHNOLOGY AND SCIENCE,18,383-391.
MLA Tang, Yankun."A Modified Single Pulse Method for Transient Thermal Impedance (TTI) Measurement of VDMOSFET Relates Gate Bias to the TTI Results".JOURNAL OF SEMICONDUCTOR TECHNOLOGY AND SCIENCE 18(2018):383-391.
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