| Effect of magnetron sputtering parameters on adhesion properties of tungsten-rhenium thin film thermocouples | |
| Tian, Bian; Yu, Qiuyue; Zhang, Zhongkai; Du, Zhe; Ren, Wei; Shi, Peng; Jiang, Zhuangde | |
| 刊名 | Ceramics International
 |
| 2018 | |
| 卷号 | 44页码:S15-S18 |
| 关键词 | Adhesion properties Alumina ceramic substrates Magnetron sputtering parameters Optimal parameter Orthogonal experiment Orthogonal table TFTCs Thin film thermocouple |
| ISSN号 | 0272-8842 |
| URL标识 | 查看原文 |
| 内容类型 | 期刊论文 |
| URI标识 | http://www.corc.org.cn/handle/1471x/2829808 |
| 专题 | 西安交通大学 |
| 推荐引用方式 GB/T 7714 | Tian, Bian,Yu, Qiuyue,Zhang, Zhongkai,et al. Effect of magnetron sputtering parameters on adhesion properties of tungsten-rhenium thin film thermocouples[J]. Ceramics International,2018,44:S15-S18. |
| APA | Tian, Bian.,Yu, Qiuyue.,Zhang, Zhongkai.,Du, Zhe.,Ren, Wei.,...&Jiang, Zhuangde.(2018).Effect of magnetron sputtering parameters on adhesion properties of tungsten-rhenium thin film thermocouples.Ceramics International,44,S15-S18. |
| MLA | Tian, Bian,et al."Effect of magnetron sputtering parameters on adhesion properties of tungsten-rhenium thin film thermocouples".Ceramics International 44(2018):S15-S18. |
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