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	Understanding and control of lateral contraction in stamping lithography
	Li, Zheng ; Tan, Li ; Liu, Gang-Yu
	2006
英文摘要	Thin film contraction under external mechanical stress can be used to miniaturize size and increase density of patterned features on top. Nonlinear Finite Element Analysis is used to provide guidance on this contraction process. It was found that the substrate contraction causes stress accumulation along interfaces between protruded features and substrate. These stress accumulation complexes the control of profile changes on patterned features and suggest a design of patterned features arranged beyond a critical distance to avoid cross-interference. ? 2006 Materials Research Society.; EI; 0
语种	英语
内容类型	会议论文
源URL	[http://ir.pku.edu.cn/handle/20.500.11897/328048]
专题	工学院
推荐引用方式 GB/T 7714	Li, Zheng,Tan, Li,Liu, Gang-Yu. Understanding and control of lateral contraction in stamping lithography[C]. 见:.

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