Comparative Study on RTN Amplitude in Planar and FinFET Devices | |
Zhang, Zexuan ; Zhang, Zhe ; Guo, Shaofeng ; Wang, Runsheng ; Wang, Xingsheng ; Cheng, Binjie ; Asenov, Asen ; Huang, Ru | |
2017 | |
英文摘要 | In this paper, the amplitude of random telegraph noise (RTN) in FinFET is studied, comparing with RTN in planar devices. The impacts of intrinsic characteristics in FinFET (channel non-uniformity and quantum confinement) on its RTN amplitude are comprehensively studied, based on the framework of "hole in the inversion layer" (HIL) model and the 3D device simulations. The results indicate that, the conventional HIL model for planar device can be extended to FinFET, if taking into account the non-uniform Fin current density. It is also found that, the RTN-induced "hole" in FinFET is smaller than that in planar device under the same inversion carrier density per gate, due to strong quantum confinement in FinFET. These results are helpful for accurate RTN amplitude modeling in FinFET.; NSFC [61522402, 61421005]; CPCI-S(ISTP); 109-110 |
语种 | 英语 |
出处 | IEEE Electron Devices Technology and Manufacturing Conference (EDTM) |
内容类型 | 其他 |
源URL | [http://ir.pku.edu.cn/handle/20.500.11897/469835] ![]() |
专题 | 信息科学技术学院 |
推荐引用方式 GB/T 7714 | Zhang, Zexuan,Zhang, Zhe,Guo, Shaofeng,et al. Comparative Study on RTN Amplitude in Planar and FinFET Devices. 2017-01-01. |
个性服务 |
查看访问统计 |
相关权益政策 |
暂无数据 |
收藏/分享 |
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。
修改评论