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	THE CHARACTERISTICS AND MORPHOLOGIES OF REACTIVELY FORMED CoSi2 FILMS FOR SELFALIGNED SILICIDE TECHNOLOGY; THE CHARACTERISTICS AND MORPHOLOGIES OF REACTIVELY FORMED CoSi2 FILMS FOR SELFALIGNED SILICIDE TECHNOLOGY
	TAO Jiang ; WU Guoying ; ZHANG Guobing ; SUN Yuxiu ; WANG Yangyuan ; DU Anyan ; CHEN Weide
	1989
关键词	annealing annealed characterize conductive sheet morphological furnace aligned resistivity vent annealing annealed characterize conductive sheet morphological furnace aligned resistivity vent
英文摘要	Combining with the morphological aspects studies,the characteristics of reactively formed CoSi2 films have been investigated.Extremely smooth,highly conductive(16 uΩ- cm) CoSi2 films were formed.In order to characterize the salicide process for CoSi2 films,XRD,AES,XPS,TEM(cross-section),SEM,sheet...; Combining with the morphological aspects studies,the characteristics of reactively formed CoSi2 films have been investigated.Extremely smooth,highly conductive(16 uΩ- cm) CoSi2 films were formed.In order to characterize the salicide process for CoSi2 films,XRD,AES,XPS,TEM(cross-section),SEM,sheet...; Chinese Institute of Electronics(CIE)、IEEE Beijing Section; 3
语种	英语
内容类型	其他
源URL	[http://ir.pku.edu.cn/handle/20.500.11897/444036]
专题	信息科学技术学院
推荐引用方式 GB/T 7714	TAO Jiang,WU Guoying,ZHANG Guobing,et al. THE CHARACTERISTICS AND MORPHOLOGIES OF REACTIVELY FORMED CoSi2 FILMS FOR SELFALIGNED SILICIDE TECHNOLOGY, THE CHARACTERISTICS AND MORPHOLOGIES OF REACTIVELY FORMED CoSi2 FILMS FOR SELFALIGNED SILICIDE TECHNOLOGY. 1989-01-01.

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