Performance and Stability Improvements of Back-Channel-Etched Amorphous Indium-Gallium-Zinc Thin-Film-Transistors by CF4+O-2 Plasma Treatment | |
Liu, Xiang ; Wang, Lisa Ling ; Hu, Hehe ; Lu, Xinhong ; Wang, Ke ; Wang, Gang ; Zhang, Shengdong | |
刊名 | IEEE ELECTRON DEVICE LETTERS |
2015 | |
关键词 | a-IGZO TFTs back-channel-etch (BCE) plasma treatment threshold voltage shift THRESHOLD VOLTAGE SHIFT OXIDE GATE |
DOI | 10.1109/LED.2015.2456034 |
英文摘要 | The performance and stability improvement of back-channel-etched amorphous indium-gallium-zinc oxide thin-film transistors (a-IGZO TFTs) by post CF4+O-2 plasma treatment is investigated. It is revealed that the metal residue of the wet-etching of source/drain electrodes degrades TFT performance and aggravates the positive threshold voltage (V-th) shift under positive gate bias stress. It is demonstrated that the CF4+O-2 plasma treatment effectively removes the metal residue and remarkably improves device performance and the Vth stability. This improvement is attributed to oxygen vacancy repairing at the back channel interface of the a-IGZO TFT by the O free radicals generated by the O-2 plasma.; National Science Foundation of China [61274084]; SCI(E); EI; ARTICLE; zhangsd@pku.edu.cn; 9; 911-913; 36 |
语种 | 英语 |
内容类型 | 期刊论文 |
源URL | [http://ir.pku.edu.cn/handle/20.500.11897/416846] |
专题 | 信息科学技术学院 |
推荐引用方式 GB/T 7714 | Liu, Xiang,Wang, Lisa Ling,Hu, Hehe,et al. Performance and Stability Improvements of Back-Channel-Etched Amorphous Indium-Gallium-Zinc Thin-Film-Transistors by CF4+O-2 Plasma Treatment[J]. IEEE ELECTRON DEVICE LETTERS,2015. |
APA | Liu, Xiang.,Wang, Lisa Ling.,Hu, Hehe.,Lu, Xinhong.,Wang, Ke.,...&Zhang, Shengdong.(2015).Performance and Stability Improvements of Back-Channel-Etched Amorphous Indium-Gallium-Zinc Thin-Film-Transistors by CF4+O-2 Plasma Treatment.IEEE ELECTRON DEVICE LETTERS. |
MLA | Liu, Xiang,et al."Performance and Stability Improvements of Back-Channel-Etched Amorphous Indium-Gallium-Zinc Thin-Film-Transistors by CF4+O-2 Plasma Treatment".IEEE ELECTRON DEVICE LETTERS (2015). |
个性服务 |
查看访问统计 |
相关权益政策 |
暂无数据 |
收藏/分享 |
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。
修改评论