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	Synthesis of Large Area Crack-free Nanostructured TiO2 with Selective Masking for Cell/Electronics Interfacing
	Li, Nannan ; Chen, Shuhui ; Chen, Jing
	2012
关键词	NST aqueous oxidation selective masking residual stress biocompatibility FABRICATION
英文摘要	The biocompatibility of Nanostructrued TiO2(NST) makes it a promising material in biological applications. Recently reported aqueous oxidation technology synthesizes NST at very low temperature, which is CMOS compatible. It suggests NST a very promising candidate for cell/electronics interfacing. However, severe cracks have been observed beyond a threshold dimension (20 mu mx20 mu m). In this study, the residue stress of NST was measured using the local curvature method. It is revealed that extra oxidation time or higher oxidation temperature would induce large residual stress, and the mask boundary played an important role. Crack-free NST with SU-8 soft mask has been fabricated in hydrogen peroxide(H2O2) solution at 80 degrees C. The NST film features a large dimension above 750x750 mu m with a thickness of 0.6 mu m. With a low contact angle, the patterned NST promoted fibroblast cell adhesion, compared to Ti and thermal SiO2.; http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcApp=PARTNER_APP&SrcAuth=LinksAMR&KeyUT=WOS:000322438500102&DestLinkType=FullRecord&DestApp=ALL_WOS&UsrCustomerID=8e1609b174ce4e31116a60747a720701 ; Engineering, Biomedical; Nanoscience & Nanotechnology; EI; CPCI-S(ISTP); 0
语种	英语
DOI标识	10.1109/NANOMED.2012.6509126
内容类型	其他
源URL	[http://ir.pku.edu.cn/handle/20.500.11897/405926]
专题	信息科学技术学院
推荐引用方式 GB/T 7714	Li, Nannan,Chen, Shuhui,Chen, Jing. Synthesis of Large Area Crack-free Nanostructured TiO2 with Selective Masking for Cell/Electronics Interfacing. 2012-01-01.

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