Study on new type LIGA mask fabrication technique

CORC > 北京大学 > 信息科学技术学院

	Study on new type LIGA mask fabrication technique
	Chen, D ; Zhu, J ; Lei, W ; Wang, S ; Zhang, DC ; Yi, FT
刊名	high energy physics and nuclear physics chinese edition
	2001
关键词	LIGA mask ICP deepetching LIGA technique X-RAY-LITHOGRAPHY DEEP
英文摘要	The fabrication of LIGA masks is a critical and challenging process in LIGA technique. As inductively coupled plasma (ICP) deepetching appears to be the most suitable source for deep silicon etching, we fabricated a new type LIGA mask using this technique. In comparison with other types of LIGA masks, the mask we fabricated has the advantages of its low cost and its simple fabrication process. Desired microstructures have also been fabricated using this new type LIGA mask in LIGA technique.; Physics, Nuclear; Physics, Particles & Fields; SCI(E); 中文核心期刊要目总览(PKU); 0; ARTICLE; 131-134; 25
语种	英语
内容类型	期刊论文
源URL	[http://ir.pku.edu.cn/handle/20.500.11897/388692]
专题	信息科学技术学院
推荐引用方式 GB/T 7714	Chen, D,Zhu, J,Lei, W,et al. Study on new type LIGA mask fabrication technique[J]. high energy physics and nuclear physics chinese edition,2001.
APA	Chen, D,Zhu, J,Lei, W,Wang, S,Zhang, DC,&Yi, FT.(2001).Study on new type LIGA mask fabrication technique.high energy physics and nuclear physics chinese edition.
MLA	Chen, D,et al."Study on new type LIGA mask fabrication technique".high energy physics and nuclear physics chinese edition (2001).