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	Direct demonstration of sensitization at 980nm optical excitation in erbium-ytterbium silicates
	Vanhoutte, Michiel ; Wang, Bing ; Zhou, Zhiping ; Michel, J??rgen ; Kimerling, Lionel C.
	2010
英文摘要	Sensitization of erbium by ytterbium in ErxYb 2-xSiO5 thin films at 980nm optical excitation is demonstrated by means of comparison of the 1.54??m photoluminescence intensities excited with 488nm and 980nm light. Additionally, it is shown that detrimental Er-Er interactions such as concentration quenching increase non-radiative decay rates at high erbium concentrations. Dilution of erbium by ytterbium reduces these interactions, leading to an increase of internal quantum efficiency. ?2010 IEEE.; EI; 0
语种	英语
DOI标识	10.1109/GROUP4.2010.5643345
内容类型	其他
源URL	[http://ir.pku.edu.cn/handle/20.500.11897/329734]
专题	信息科学技术学院
推荐引用方式 GB/T 7714	Vanhoutte, Michiel,Wang, Bing,Zhou, Zhiping,et al. Direct demonstration of sensitization at 980nm optical excitation in erbium-ytterbium silicates. 2010-01-01.

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