Thermal contact resistance across nanoscale silicon dioxide and silicon   interface

doi:10.1063/1.4754513

CORC > 北京大学 > 信息科学技术学院

	Thermal contact resistance across nanoscale silicon dioxide and silicon interface
	Chen, Jie ; Zhang, Gang ; Li, Baowen
刊名	应用物理杂志
	2012
关键词	NANOWIRE BUILDING-BLOCKS BOUNDARY CONDUCTANCE INTERATOMIC POTENTIALS PHONON DISPERSIONS CONDUCTIVITY SI TEMPERATURE PERFORMANCE MOTIONS SYSTEMS
DOI	10.1063/1.4754513
英文摘要	Silicon dioxide and silicon (SiO2/Si) interface plays a very important role in semiconductor industry. However, at nanoscale, its interfacial thermal properties have not been well understood so far. In this paper, we systematically study the interfacial thermal resistance (Kapitza resistance) of a heterojunction composed of amorphous silicon dioxide and crystalline silicon by using molecular dynamics simulations. Numerical results have shown that Kapitza resistance at SiO2/Si interface depends on the interfacial coupling strength remarkably. In the weak interfacial coupling limit, Kapitza resistance depends on both the detailed interfacial structure and the length of the heterojunction, showing large fluctuation among different samples. In contrast, it is almost insensitive to the detailed interfacial structure or the length of the heterojunction in the strong interfacial coupling limit, giving rise to a nearly constant value around 0.9 x 10(-9) m(2)KW(-1) at room temperature. Moreover, the temperature dependent Kapitza resistance in the strong interfacial coupling limit has also been examined. Our study provides useful guidance to the thermal management and heat dissipation across nanoscale SiO2/Si interface, in particular, for the design of silicon nanowire based nano electronics and photonics devices. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4754513]; Physics, Applied; SCI(E); EI; 12; ARTICLE; 6; 112
语种	英语
内容类型	期刊论文
源URL	[http://ir.pku.edu.cn/handle/20.500.11897/230781]
专题	信息科学技术学院
推荐引用方式 GB/T 7714	Chen, Jie,Zhang, Gang,Li, Baowen. Thermal contact resistance across nanoscale silicon dioxide and silicon interface[J]. 应用物理杂志,2012.
APA	Chen, Jie,Zhang, Gang,&Li, Baowen.(2012).Thermal contact resistance across nanoscale silicon dioxide and silicon interface.应用物理杂志.
MLA	Chen, Jie,et al."Thermal contact resistance across nanoscale silicon dioxide and silicon interface".应用物理杂志 (2012).