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	Monte Carlo simulation of Cu-resistivity
	Wang, Zhuo Yan ; Gang, Du ; Kang, Jin Feng ; Liu, Xiao Yan ; Ruqi, Han
	2008
英文摘要	We have developed an optimized model for electron behavior in Cu-Iine and we have implemented it using Monte Carlo method. Our model takes into account not only four normal scatterings but also the grain boundary scattering and the surface roughness scattering. The model has been tested with different line width and providing a good agreement with both calculated results and ITRS data. ?2008 IEEE.; EI; 1
语种	英语
DOI标识	10.1109/SISPAD.2008.4648302
内容类型	其他
源URL	[http://ir.pku.edu.cn/handle/20.500.11897/153674]
专题	信息科学技术学院
推荐引用方式 GB/T 7714	Wang, Zhuo Yan,Gang, Du,Kang, Jin Feng,et al. Monte Carlo simulation of Cu-resistivity. 2008-01-01.

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