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Implementation of Fully Self-Aligned Homojunction Double-Gate a-IGZO TFTs
He, Xin ; Wang, Longyan ; Xiao, Xiang ; Deng, Wei ; Zhang, Letao ; Chan, Mansun ; Zhang, Shengdong
刊名ieee electron device letters
2014
关键词Amorphous indium-gallium-zinc-oxide (a-IGZO) double-gate self-aligned thin-film transistor (TFT) THIN-FILM TRANSISTORS
DOI10.1109/LED.2014.2336232
英文摘要A simple method of fabricating fully self-aligned double-gate (SADG) homojunction a-IGZO TFTs is proposed and experimentally demonstrated for the first time. The self-alignment between the bottom-and top-gates is realized with one backside-illuminated photolithographic step; and that between the source/drain regions and the two gates is formed by both argon plasma treatment and hydrogen doping. The resulting overlap between the gate and source/drain regions is about 0.3 m. Excellent symmetry between bidirectional transfer characteristics in the fabricated SADG TFTs is observed. Moreover, the dynamic threshold voltage operation is well demonstrated, and the driving capability, electrical stress effects under tied and separate gate biases are investigated.; http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcApp=PARTNER_APP&SrcAuth=LinksAMR&KeyUT=WOS:000341574200012&DestLinkType=FullRecord&DestApp=ALL_WOS&UsrCustomerID=8e1609b174ce4e31116a60747a720701 ; Engineering, Electrical & Electronic; SCI(E); EI; 1; ARTICLE; zhangsd@pku.edu.cn; 9; 927-929; 35
语种英语
内容类型期刊论文
源URL[http://ir.pku.edu.cn/handle/20.500.11897/152012]  
专题信息科学技术学院
推荐引用方式
GB/T 7714
He, Xin,Wang, Longyan,Xiao, Xiang,et al. Implementation of Fully Self-Aligned Homojunction Double-Gate a-IGZO TFTs[J]. ieee electron device letters,2014.
APA He, Xin.,Wang, Longyan.,Xiao, Xiang.,Deng, Wei.,Zhang, Letao.,...&Zhang, Shengdong.(2014).Implementation of Fully Self-Aligned Homojunction Double-Gate a-IGZO TFTs.ieee electron device letters.
MLA He, Xin,et al."Implementation of Fully Self-Aligned Homojunction Double-Gate a-IGZO TFTs".ieee electron device letters (2014).
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