A new design for secondary electron measurement and application

doi:10.1007/978-981-13-1316-5_42

	A new design for secondary electron measurement and application
	Yan BJ(闫保军); Li, Jinhai; Yan, Baojun; Liu SL(刘术林); Liu, Shulin
刊名	SPRINGER PROCEEDINGS IN PHYSICS
	2018
卷号	213 页码:225-232
ISSN号	0930-8989
DOI	10.1007/978-981-13-1316-5_42
文献子类	Proceedings Paper
英文摘要	The secondary electron is researched in many fields. In order to measure the secondary electron angular distribution of all the solid angle, the X axis support and Y axis support are proposed. The energy distribution of the secondary electron also can be measured. The accumulated charge on the insulated material surface during the secondary electron measurement has very bad effects. Although many methods have been used for the charge neutralization, many defects are still not resolved. So the plasma neutralization is proposed. The plasma neutralization can also be used in the electron microscopy. © Springer Nature Singapore Pte Ltd. 2018.
电子版国际标准刊号	1867-4941
会议地点	Beijing, China
语种	英语
内容类型	期刊论文
源URL	[http://ir.ihep.ac.cn/handle/311005/286592]
专题	高能物理研究所_实验物理中心高能物理研究所_多学科研究中心
作者单位	中国科学院高能物理研究所
推荐引用方式 GB/T 7714	Yan BJ,Li, Jinhai,Yan, Baojun,et al. A new design for secondary electron measurement and application[J]. SPRINGER PROCEEDINGS IN PHYSICS,2018,213:225-232.
APA	闫保军,Li, Jinhai,Yan, Baojun,刘术林,&Liu, Shulin.(2018).A new design for secondary electron measurement and application.SPRINGER PROCEEDINGS IN PHYSICS,213,225-232.
MLA	闫保军,et al."A new design for secondary electron measurement and application".SPRINGER PROCEEDINGS IN PHYSICS 213(2018):225-232.