Fabrication and Photosensitivity of CdS/Silicon Nanoscrew Photoresistor

doi:10.1002/slct.201701707

	Fabrication and Photosensitivity of CdS/Silicon Nanoscrew Photoresistor
	Wang YT(王玉田); Wang B(王波); Zhou Y(周悦); Yi FT(伊福廷); Liu J(刘静); Liu, J., F. Yi, Y. Zhou, B. Wang, T. Zhang and Y. Wang; Zhang TC(张天冲)
刊名	CHEMISTRYSELECT
	2017
卷号	2 期号:27 页码:8577-8582
关键词	Cadmium sulfide 1 Fabrication 2 Nanoscrew 3 Photoresistor 4
ISSN号	2365-6549
DOI	10.1002/slct.201701707
文献子类	Article
英文摘要	Silicon nanoscrews with aspect ratio of 3, 6 and 9 corresponding to 4, 8 and 12 etching cycles are fabricated by CsCl self-assembly lithography and inductively coupled plasma (ICP) dry etching with "Bosch Process", which can reduce the reflection to below to 10% for wavelength from 400 to 1000 nm. A layer of Cadmium sulfide (CdS) film covers onto the silicon nanoscrews surface to photoresistor. The XRD pattern shows the CdS packed both on the nanoscrew and planar surface are well-crystallized. The nanoscrew substrate with the large surface ratio can increase the light absorption and quantity of sensitive material, which can improve the photosensitivity of the CdS photoresistor compared to the planar one obviously. However, the aspect ratio of nanoscrew is not the larger the better for that the high aspect ratio also increases the difficulty of CdS package. The photosensitivity response test results show that the nanoscrew photoresistor with 6 aspect ratio has the best performance under different illumination. With 10000 mu W/cm(2), the best photosensitivity response achieves to 141 for nanoscrew sample.
WOS关键词	SOLAR-CELLS ; NANOCRYSTALS ; NANOPILLARS ; SI
WOS研究方向	Chemistry
语种	英语
WOS记录号	WOS:000416746900049
内容类型	期刊论文
源URL	[http://ir.ihep.ac.cn/handle/311005/285084]
专题	高能物理研究所_多学科研究中心
作者单位	中国科学院高能物理研究所
推荐引用方式 GB/T 7714	Wang YT,Wang B,Zhou Y,et al. Fabrication and Photosensitivity of CdS/Silicon Nanoscrew Photoresistor[J]. CHEMISTRYSELECT,2017,2(27):8577-8582.
APA	王玉田.,王波.,周悦.,伊福廷.,刘静.,...&张天冲.(2017).Fabrication and Photosensitivity of CdS/Silicon Nanoscrew Photoresistor.CHEMISTRYSELECT,2(27),8577-8582.
MLA	王玉田,et al."Fabrication and Photosensitivity of CdS/Silicon Nanoscrew Photoresistor".CHEMISTRYSELECT 2.27(2017):8577-8582.