Sensitive measurement of stress birefringence of fused silica substrates with cavity ring-down technique

doi:10.1364/OL.43.000843

CORC > 光电技术研究所 > 中国科学院光电技术研究所 > 薄膜光学技术研究室（十一室）

	Sensitive measurement of stress birefringence of fused silica substrates with cavity ring-down technique
	Xiao, Shilei 1; Li, Bincheng 1; Cui, Hao 1,2; Wang, Jing 1
刊名	OPTICS LETTERS
	2018-02-15
卷号	43 期号:4 页码:843-846
关键词	Birefringence Light measurement Substrates
ISSN号	0146-9592
DOI	10.1364/OL.43.000843
文献子类	J
英文摘要	A polarized cavity ring-down technique was employed to precisely measure the residual stress birefringence of fused silica substrates with greatly enhanced measurement sensitivity. Intracavity birefringence resulted in beating of two orthogonally resonant modes in a Fabry-Perot cavity. The beating frequency of the ring-down decay was directly related to phase retardation induced by stress birefringence of optical components inside the cavity. For fused silica substrates, measurement reproducibilities of phase retardation of 2.38 x 10(-6) rad and of optical path difference of 2.4 x 10(-4) nm were experimentally achieved. In addition, spatially resolved mapping of stress birefringence of a fused silica substrate was obtained, which was in good agreement with that measured with a commercial stress birefringence measurement instrument. The experimental results demonstrated that cavity ring-down is a sensitive technique for stress birefringence measurements of optical components. (C) 2018 Optical Society of America
语种	英语
WOS记录号	WOS:000425123700055
内容类型	期刊论文
源URL	[http://ir.ioe.ac.cn/handle/181551/9391]
专题	光电技术研究所_薄膜光学技术研究室（十一室）
作者单位	1.School of Optoelectronic Information, University of Electronic Science and Technology of China, Chengdu; 610054, China; 2.Institute of Optics and Electronics, Chinese Academy of Sciences, Shuangliu, Chengdu; 610209, China
推荐引用方式 GB/T 7714	Xiao, Shilei,Li, Bincheng,Cui, Hao,et al. Sensitive measurement of stress birefringence of fused silica substrates with cavity ring-down technique[J]. OPTICS LETTERS,2018,43(4):843-846.
APA	Xiao, Shilei,Li, Bincheng,Cui, Hao,&Wang, Jing.(2018).Sensitive measurement of stress birefringence of fused silica substrates with cavity ring-down technique.OPTICS LETTERS,43(4),843-846.
MLA	Xiao, Shilei,et al."Sensitive measurement of stress birefringence of fused silica substrates with cavity ring-down technique".OPTICS LETTERS 43.4(2018):843-846.