Solvent vapor induced dewetting in diblock copolymer thin films

doi:10.1016/j.polymer.2005.05.042

CORC > 化学研究所 > 中国科学院化学研究所

	Solvent vapor induced dewetting in diblock copolymer thin films
	Peng, J; Xuan, Y; Wang, HF; Li, BY; Han, YC
刊名	POLYMER
	2005-07-11
卷号	46 期号:15 页码:5767-5772
关键词	Dewetting Diblock Copolymers Fractal-like Holes
ISSN号	0032-3861
DOI	10.1016/j.polymer.2005.05.042
英文摘要	The dewetting pattern development of thin film of poly(styrene)-block-poly(methyl methacrylate) (PS-b-PMMA) diblock copolymer has been studied after 'annealing' in the PMMA block selective solvent vapor. Initially, typical circular dewetted holes are observed. Further annealing, however, results in the formation of fractal-like holes. The heterogeneous stress induced by the residual solvent remaining in the film after spin-coating induces the anisotropy of the polymer mobility during the annealing process, which triggers the fort-nation of the intriguing surface patterns. (c) 2005 Elsevier Ltd. All rights reserved.
语种	英语
出版者	ELSEVIER SCI LTD
WOS记录号	WOS:000230374400043
内容类型	期刊论文
源URL	[http://ir.iccas.ac.cn/handle/121111/56431]
专题	中国科学院化学研究所
通讯作者	Han, YC
作者单位	Chinese Acad Sci, Changchun Inst Appl Chem, State Key Lab Polymer Phys & Chem, Changchun 130022, Peoples R China
推荐引用方式 GB/T 7714	Peng, J,Xuan, Y,Wang, HF,et al. Solvent vapor induced dewetting in diblock copolymer thin films[J]. POLYMER,2005,46(15):5767-5772.
APA	Peng, J,Xuan, Y,Wang, HF,Li, BY,&Han, YC.(2005).Solvent vapor induced dewetting in diblock copolymer thin films.POLYMER,46(15),5767-5772.
MLA	Peng, J,et al."Solvent vapor induced dewetting in diblock copolymer thin films".POLYMER 46.15(2005):5767-5772.