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Wavelet analysis of the surface morphologic of nanocrystalline TiO2 thin films
Lin, Y; Xiao, XR; Li, XP; Zhou, XW
刊名SURFACE SCIENCE
2005-03-20
卷号579期号:1页码:37-46
关键词Atomic Force Microscopy Titanium Oxide Semiconducting Surfaces Surface Chemical Reaction Fractal Surface Surface Structure Morphology Toughness And Topography
ISSN号0039-6028
DOI10.1016/j.susc.2005.01.033
英文摘要Surface morphologies of nanocrystalline TiO2 thin films were studied by analyzing the surface profile of AFM images using wavelet transform method. Based on characterizing the fractal feature and computing the image details at different orientations and resolutions, the surface textures of nanocrystalline TiO2 thin films before and after chemical treatment were examined. The results reveal that titanium isopropoxide treatment leads to an increase of surface roughness. The related mechanism of modification of the microstructure by chemical treatment associated with the improvement of the photocurrent response is discussed. (c) 2005 Elsevier B.V. All rights reserved.
语种英语
出版者ELSEVIER SCIENCE BV
WOS记录号WOS:000227850300005
内容类型期刊论文
源URL[http://ir.iccas.ac.cn/handle/121111/56369]  
专题中国科学院化学研究所
通讯作者Xiao, XR
作者单位Chinese Acad Sci, Inst Chem, Ctr Mol Sci, Key Lab Photochem, Beijing 100080, Peoples R China
推荐引用方式
GB/T 7714
Lin, Y,Xiao, XR,Li, XP,et al. Wavelet analysis of the surface morphologic of nanocrystalline TiO2 thin films[J]. SURFACE SCIENCE,2005,579(1):37-46.
APA Lin, Y,Xiao, XR,Li, XP,&Zhou, XW.(2005).Wavelet analysis of the surface morphologic of nanocrystalline TiO2 thin films.SURFACE SCIENCE,579(1),37-46.
MLA Lin, Y,et al."Wavelet analysis of the surface morphologic of nanocrystalline TiO2 thin films".SURFACE SCIENCE 579.1(2005):37-46.
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