Micro-patterning of 3D colloidal photonic crystals via solvent-assisted imprint lithography

doi:10.1039/c4ra12958j

CORC > 化学研究所 > 中国科学院化学研究所

	Micro-patterning of 3D colloidal photonic crystals via solvent-assisted imprint lithography
	Ding, Tao 1; Chen, Li 3; Long, Yue 2; Song, Kai 2
刊名	RSC ADVANCES
	2015
卷号	5 期号:11 页码:8509-8513
ISSN号	2046-2069
DOI	10.1039/c4ra12958j
英文摘要	Scalable patterning of photonic crystals is critical in building advanced photonic devices. In this communication, we applied solvent-assisted imprinting technique to define the patterns of pre-formed colloidal photonic crystal (CPC) films. The minute solvent within the PDMS stamp along with the conformal pressure partially melts and relocates the polymers, thereby forming large-scale micropatterns in the CPC.
语种	英语
出版者	ROYAL SOC CHEMISTRY
WOS记录号	WOS:000347720900097
内容类型	期刊论文
源URL	[http://ir.iccas.ac.cn/handle/121111/53353]
专题	中国科学院化学研究所
通讯作者	Ding, Tao
作者单位	1.Univ Cambridge, Cavendish Lab, Nanophoton Ctr, Cambridge CB3 0HE, England 2.Chinese Acad Sci, Tech Inst Phys & Chem, Lab Bioinspired Smart Interface Sci, Beijing 100190, Peoples R China 3.Chinese Acad Sci, Inst Chem, Beijing Natl Lab Mol Sci, Beijing 100190, Peoples R China
推荐引用方式 GB/T 7714	Ding, Tao,Chen, Li,Long, Yue,et al. Micro-patterning of 3D colloidal photonic crystals via solvent-assisted imprint lithography[J]. RSC ADVANCES,2015,5(11):8509-8513.
APA	Ding, Tao,Chen, Li,Long, Yue,&Song, Kai.(2015).Micro-patterning of 3D colloidal photonic crystals via solvent-assisted imprint lithography.RSC ADVANCES,5(11),8509-8513.
MLA	Ding, Tao,et al."Micro-patterning of 3D colloidal photonic crystals via solvent-assisted imprint lithography".RSC ADVANCES 5.11(2015):8509-8513.