Femtosecond photoelectron imaging of NO at 410 nm

doi:10.1016/j.ijleo.2018.02.019

	Femtosecond photoelectron imaging of NO at 410 nm
	Li, Yuehua 1; Wang, Yi 1; Guo, Wei 1,2
刊名	OPTIK
	2018
卷号	161 页码:151-155
关键词	Freeman Resonance Rydberg States Resonant/nonresonant Population
ISSN号	0030-4026
DOI	10.1016/j.ijleo.2018.02.019
文献子类	Article
英文摘要	The simultaneous measurement of the photoelectron kinetic energy and angular distributions of NO were performed as a function of 410 nm laser intensities by femtosecond photoelectron imaging. The photoelectron kinetic energies are nearly independent of the laser intensities. The insensitivity of the photoelectron kinetic energy to the laser peak intensity suggests that peaks in the photoelectron spectra result from Freemen resonance, characteristic of the occurrence of real population on the intermediate states. The relative amplitudes of photoelectron peaks indicate that lower laser intensities emphasize the resonant population while higher laser intensities favor nonresonant population. The A(2) Sigma(+)(nu = 2) state can be weakly coupled to the B-2 Pi(nu = 4) state, results in a small part of population on B-2 Pi(nu = 4) state transferred from A(2) Sigma(+)(nu = 2) state. The strong field effect leads to more anisotropy of ATI than that of non-ATI. The modulation of populations in electronic states can be achieved by adjusting laser peak intensities. The results can provide some important basis for realizing quantum manipulation of molecules experimentally. (C) 2018 Elsevier GmbH. All rights reserved.
WOS关键词	ABOVE-THRESHOLD IONIZATION ; MULTIPHOTON IONIZATION ; LASER-PULSES ; POPULATIONS ; HELIUM
WOS研究方向	Optics
语种	英语
出版者	ELSEVIER GMBH, URBAN & FISCHER VERLAG
WOS记录号	WOS:000429499100019
内容类型	期刊论文
源URL	[http://cas-ir.dicp.ac.cn/handle/321008/169158]
专题	大连化学物理研究所_中国科学院大连化学物理研究所
通讯作者	Li, Yuehua
作者单位	1.Univ South China, Sch Elect Engn, Hengyang 421001, Peoples R China 2.Dalian Inst Chem Phys, State Key Lab Mol React Dynam, Dalian 116023, Peoples R China
推荐引用方式 GB/T 7714	Li, Yuehua,Wang, Yi,Guo, Wei. Femtosecond photoelectron imaging of NO at 410 nm[J]. OPTIK,2018,161:151-155.
APA	Li, Yuehua,Wang, Yi,&Guo, Wei.(2018).Femtosecond photoelectron imaging of NO at 410 nm.OPTIK,161,151-155.
MLA	Li, Yuehua,et al."Femtosecond photoelectron imaging of NO at 410 nm".OPTIK 161(2018):151-155.