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	Structural and optical characterization of zn1-xcdxo thin films deposited by dc reactive magnetron sputtering
	Ma, DW; Ye, ZZ; Huang, JY; Zhao, BH; Wan, SK; Sun, XH; Wang, ZG
刊名	Chinese physics letters
	2003-06-01
卷号	20期号:6页码:942-943
ISSN号	0256-307X
通讯作者	Ma, dw()
英文摘要	Zn1-xcdxo crystal thin films with different compositions were prepared on silicon and sapphire substrates by the dc reactive magnetron sputtering technique. x-ray diffraction measurements show that the zn1-xcdxo films are of completely (002)-preferred orientation for x less than or equal to 0.6. for x = 0.8, the elm is a mixture of zno hexagonal wurtzite crystals and cdo cubic crystals. for pure cdo, it is highly (200) preferential-oriented. photoluminescence spectrum measurement shows that the zn1-xcdxo (x = 0.2) thin film has a redshift of 0.14 ev from that of zno reported previously.
WOS关键词	PHASE EPITAXIAL-GROWTH ; PHOTOLUMINESCENT PROPERTIES ; SPRAY-PYROLYSIS ; ZNO ; MGXZN1-XO
WOS研究方向	Physics
WOS类目	Physics, Multidisciplinary
语种	英语
出版者	CHINESE PHYSICAL SOC
WOS记录号	WOS:000183671800047
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/2429331
专题	半导体研究所
通讯作者	Ma, DW
作者单位	1.Zhejiang Univ, State Key Lab Silicon Mat, Hangzhou 310027, Peoples R China 2.Chinese Acad Sci, Inst Semicond, Beijing 100083, Peoples R China
推荐引用方式 GB/T 7714	Ma, DW,Ye, ZZ,Huang, JY,et al. Structural and optical characterization of zn1-xcdxo thin films deposited by dc reactive magnetron sputtering[J]. Chinese physics letters,2003,20(6):942-943.
APA	Ma, DW.,Ye, ZZ.,Huang, JY.,Zhao, BH.,Wan, SK.,...&Wang, ZG.(2003).Structural and optical characterization of zn1-xcdxo thin films deposited by dc reactive magnetron sputtering.Chinese physics letters,20(6),942-943.
MLA	Ma, DW,et al."Structural and optical characterization of zn1-xcdxo thin films deposited by dc reactive magnetron sputtering".Chinese physics letters 20.6(2003):942-943.

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