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Optical characterization of high-purity cubic gan grown on gaas (001) substrate by metalorganic chemical vapor deposition
Xu, DP; Yang, H; Li, JB; Zhao, DG; Li, SF; Zhuang, SM; Wu, RH; Chen, Y; Li, GH
刊名Applied physics letters
2000-05-22
卷号76期号:21页码:3025-3027
ISSN号0003-6951
通讯作者Yang, h()
英文摘要The optical properties of cubic gan films have been investigated in the temperature range of 10-300 k. five peaks were observed at 10 k. from the dependence of photoluminescence emissions on the temperature and excitation intensity, we have assigned two of the five peaks (2.926 and 2.821 ev) to donor-acceptor pair (dap) transitions. furthermore, these two peaks were found to be related to a common shallow donor involved in the peak position previously reported at 3.150 ev. the intensities of dap transitions were much weaker than that of excitonic emission even at low temperature, indicating a relatively high purity of our samples. (c) 2000 american institute of physics. [s0003-6951(00)00921-9].
WOS关键词MOLECULAR-BEAM EPITAXY ; PHOTOLUMINESCENCE
WOS研究方向Physics
WOS类目Physics, Applied
语种英语
出版者AMER INST PHYSICS
WOS记录号WOS:000087066500017
内容类型期刊论文
URI标识http://www.corc.org.cn/handle/1471x/2428782
专题半导体研究所
通讯作者Yang, H
作者单位1.Chinese Acad Sci, Inst Semicond, State Key Lab Integrated Optoelect, Beijing 100083, Peoples R China
2.Chinese Acad Sci, Inst Semicond, Natl Res Ctr Optoelect Technol, Beijing 100083, Peoples R China
3.Chinese Acad Sci, Inst Semicond, Natl Lab Superlattices & Microstruct, Beijing 100083, Peoples R China
推荐引用方式
GB/T 7714
Xu, DP,Yang, H,Li, JB,et al. Optical characterization of high-purity cubic gan grown on gaas (001) substrate by metalorganic chemical vapor deposition[J]. Applied physics letters,2000,76(21):3025-3027.
APA Xu, DP.,Yang, H.,Li, JB.,Zhao, DG.,Li, SF.,...&Li, GH.(2000).Optical characterization of high-purity cubic gan grown on gaas (001) substrate by metalorganic chemical vapor deposition.Applied physics letters,76(21),3025-3027.
MLA Xu, DP,et al."Optical characterization of high-purity cubic gan grown on gaas (001) substrate by metalorganic chemical vapor deposition".Applied physics letters 76.21(2000):3025-3027.
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