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Pseudo-rhombus-shaped subwavelength crossed gratings of gaas for broadband antireflection
Chen Xi1; Fan Zhong-Chao2; Zhang Jing1; Song Guo-Feng1; Chen Liang-Hui1
刊名Chinese physics letters
2010-12-01
卷号27期号:12页码:3
ISSN号0256-307X
DOI10.1088/0256-307x/27/12/124210
通讯作者Chen xi(chenxi@semi.ac.cn)
英文摘要Holographic lithography coupled with the nonlinear response of photoresist to the exposure is adopted to fabricate porous photoresist (pr) mask. conventional dot pr mask is also generated, and both patterns are transferred into a underlying gaas substrate by the optimal dry etching process to obtain tapered subwavelength crossed gratings (swcgs) to mimic the moth-eye structure. in comparison of the experiment and simulation, the closely-packed pseudo-rhombus-shaped gaas swcgs resulting from the porous mask outperforms the conical counterpart which comes from the dot mask, and achieves a reported lowest mean spectral reflectance of 1.1%.
WOS关键词SILICON ; REFLECTION ; ABSORPTION ; LIGHT
WOS研究方向Physics
WOS类目Physics, Multidisciplinary
语种英语
出版者IOP PUBLISHING LTD
WOS记录号WOS:000285390300028
内容类型期刊论文
URI标识http://www.corc.org.cn/handle/1471x/2428053
专题半导体研究所
通讯作者Chen Xi
作者单位1.Chinese Acad Sci, Inst Semicond, Lab Nanooptoelect, Beijing 100083, Peoples R China
2.Chinese Acad Sci, Inst Semicond, Engn Res Ctr Semicond Integrated Technol, Beijing 100083, Peoples R China
推荐引用方式
GB/T 7714
Chen Xi,Fan Zhong-Chao,Zhang Jing,et al. Pseudo-rhombus-shaped subwavelength crossed gratings of gaas for broadband antireflection[J]. Chinese physics letters,2010,27(12):3.
APA Chen Xi,Fan Zhong-Chao,Zhang Jing,Song Guo-Feng,&Chen Liang-Hui.(2010).Pseudo-rhombus-shaped subwavelength crossed gratings of gaas for broadband antireflection.Chinese physics letters,27(12),3.
MLA Chen Xi,et al."Pseudo-rhombus-shaped subwavelength crossed gratings of gaas for broadband antireflection".Chinese physics letters 27.12(2010):3.
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