Using different carrier gases to control aln film stress and the effect on morphology, structural properties and optical properties | |
Hu, W. G.; Liu, X. L.; Jiao, C. M.; Wei, H. Y.; Kang, T. T.; Zhang, P. F.; Zhang, R. Q.; Fan, H. B.; Zhu, Q. S. | |
刊名 | Journal of physics d-applied physics
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2007-12-07 | |
卷号 | 40期号:23页码:7462-7466 |
ISSN号 | 0022-3727 |
DOI | 10.1088/0022-3727/40/23/030 |
通讯作者 | Hu, w. g.(sivamay@semi.ac.cn) |
英文摘要 | On the metalorganic chemical vapour deposition growth of aln, by adjusting h-2+n-2 mixture gas components, we can gradually control island dimension. during the volmer - weber growth, the 2-dimensional coalescence of the islands induces an intrinsic tensile stress. then, this process can control the in-plane stress: with the n-2 content increasing from 0 to 3 slm, the in-plane stress gradually changes from 1.5 gpa tensile stress to - 1.2gpa compressive stress. especially, with the 0.5 slm n-2 + 2.5 slm h-2 mixture gas, the in-plane stress is only 0.1 gpa, which is close to the complete relaxation state. under this condition, this sample has good crystal and optical qualities. |
WOS关键词 | VAPOR-PHASE EPITAXY ; WURTZITE-TYPE CRYSTALS ; THIN-FILMS ; ALUMINUM NITRIDE ; INTRINSIC STRESS ; GAN ; SAPPHIRE ; AIN ; DEPOSITION ; STRAIN |
WOS研究方向 | Physics |
WOS类目 | Physics, Applied |
语种 | 英语 |
出版者 | IOP PUBLISHING LTD |
WOS记录号 | WOS:000251797900040 |
内容类型 | 期刊论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/2426905 |
专题 | 半导体研究所 |
通讯作者 | Hu, W. G. |
作者单位 | Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 10083, Peoples R China |
推荐引用方式 GB/T 7714 | Hu, W. G.,Liu, X. L.,Jiao, C. M.,et al. Using different carrier gases to control aln film stress and the effect on morphology, structural properties and optical properties[J]. Journal of physics d-applied physics,2007,40(23):7462-7466. |
APA | Hu, W. G..,Liu, X. L..,Jiao, C. M..,Wei, H. Y..,Kang, T. T..,...&Zhu, Q. S..(2007).Using different carrier gases to control aln film stress and the effect on morphology, structural properties and optical properties.Journal of physics d-applied physics,40(23),7462-7466. |
MLA | Hu, W. G.,et al."Using different carrier gases to control aln film stress and the effect on morphology, structural properties and optical properties".Journal of physics d-applied physics 40.23(2007):7462-7466. |
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