Role of microstructure on surface and subsurface damage of sintered silicon carbide during grinding and polishing | |
Gao, Jianqin1,2; Chen, Jian1; Liu, Guiling1; Yan, Yongpe1; Liu, Xuejian1; Huang, Zhengren1 | |
刊名 | Wear
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2010-12-02 | |
卷号 | 270期号:1-2页码:88-94 |
关键词 | Surface topography Sintered silicon carbide Fracture Afm Electron microscopy |
ISSN号 | 0043-1648 |
DOI | 10.1016/j.wear.2010.09.009 |
通讯作者 | Huang, zhengren() |
英文摘要 | Sintered silicon carbide with different microstructures equiaxed grain (eq) and elongated grain (el) were prepared the role of microstructure on surface and subsurface damage during grinding and polishing was investigated at the same time the correlation between microstructure and material removal mechanism was studied the surface and subsurface damage were observed by atomic force microscope (afm) and transmission electron microscopy (tem) more grain pulling-out was found on the polished surface with eq than that with el the degree of grain pulling-out is related to aspect ratio and grain diameter of individual grains lateral cracks appeared in subsurface for silicon carbide samples with eq during grinding and polishing while only plastic deformation could be observed with el during polishing material removal mechanism was found to change from brittle fracture to plastic deformation for sintered silicon carbide ceramics with el as machine procedure moved on from grinding to polishing the research related surface and subsurface damage to the microstructure of sic ceramics and will provide valuable insights into the material removal mechanism (c) 2010 elsevier b v all rights reserved |
WOS关键词 | MATERIAL-REMOVAL MECHANISMS ; ALPHA-SIALON CERAMICS ; ALUMINA ; WEAR |
WOS研究方向 | Engineering ; Materials Science |
WOS类目 | Engineering, Mechanical ; Materials Science, Multidisciplinary |
语种 | 英语 |
出版者 | ELSEVIER SCIENCE SA |
WOS记录号 | WOS:000285667200011 |
内容类型 | 期刊论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/2406753 |
专题 | 中国科学院大学 |
通讯作者 | Huang, Zhengren |
作者单位 | 1.Chinese Acad Sci, Shanghai Inst Ceram, Shanghai 200050, Peoples R China 2.Chinese Acad Sci, Grad Sch, Beijing 100039, Peoples R China |
推荐引用方式 GB/T 7714 | Gao, Jianqin,Chen, Jian,Liu, Guiling,et al. Role of microstructure on surface and subsurface damage of sintered silicon carbide during grinding and polishing[J]. Wear,2010,270(1-2):88-94. |
APA | Gao, Jianqin,Chen, Jian,Liu, Guiling,Yan, Yongpe,Liu, Xuejian,&Huang, Zhengren.(2010).Role of microstructure on surface and subsurface damage of sintered silicon carbide during grinding and polishing.Wear,270(1-2),88-94. |
MLA | Gao, Jianqin,et al."Role of microstructure on surface and subsurface damage of sintered silicon carbide during grinding and polishing".Wear 270.1-2(2010):88-94. |
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