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	Annealing effects on residual stress of wo2/sio2 multilayers
	Shen, Yanming1,2; Han, Zhaoxia3; Shao, Jianda1; Shao, Shuying1; He, Hongbo1
刊名	Chinese optics letters
	2008-03-10
卷号	6期号:3页码:225-227
ISSN号	1671-7694
通讯作者	Shen, yanming(shenyanming@siom.ac.cn)
英文摘要	Hfo2/sio2 multilayer films were deposited on bk7 glass substrates by electron beam evaporation method. the effects of annealing at the temperature between 200 and 400 degrees c on residual stresses have been studied. it is found that the residual stress of as-deposited hfo2/sio2 multilayers is compressive. it becomes tensile after annealing at 200 degrees c, and then the value of tensile stress increases as annealing temperature increases. and cracks appear in the film because tensile stress is too large when the sample is annealed at 400 degrees c. at the same time, the crystallite size increases and interplanar distance decreases with the increase of annealing temperature. the variation of residual stresses is corresponding with the evolution of structures.
WOS关键词	THIN-FILMS ; COATINGS
WOS研究方向	Optics
WOS类目	Optics
语种	英语
出版者	SCIENCE CHINA PRESS
WOS记录号	WOS:000255024700021
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/2387091
专题	中国科学院大学
通讯作者	Shen, Yanming
作者单位	1.Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Shanghai 201800, Peoples R China 2.Grad Univ Chinese Acad Sci, Beijing 100049, Peoples R China 3.Henan Univ Sci & Technol, Sch Sci, Luoyang 471003, Peoples R China
推荐引用方式 GB/T 7714	Shen, Yanming,Han, Zhaoxia,Shao, Jianda,et al. Annealing effects on residual stress of wo2/sio2 multilayers[J]. Chinese optics letters,2008,6(3):225-227.
APA	Shen, Yanming,Han, Zhaoxia,Shao, Jianda,Shao, Shuying,&He, Hongbo.(2008).Annealing effects on residual stress of wo2/sio2 multilayers.Chinese optics letters,6(3),225-227.
MLA	Shen, Yanming,et al."Annealing effects on residual stress of wo2/sio2 multilayers".Chinese optics letters 6.3(2008):225-227.

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