Annealing effects on residual stress of wo2/sio2 multilayers | |
Shen, Yanming1,2; Han, Zhaoxia3; Shao, Jianda1; Shao, Shuying1; He, Hongbo1 | |
刊名 | Chinese optics letters
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2008-03-10 | |
卷号 | 6期号:3页码:225-227 |
ISSN号 | 1671-7694 |
通讯作者 | Shen, yanming(shenyanming@siom.ac.cn) |
英文摘要 | Hfo2/sio2 multilayer films were deposited on bk7 glass substrates by electron beam evaporation method. the effects of annealing at the temperature between 200 and 400 degrees c on residual stresses have been studied. it is found that the residual stress of as-deposited hfo2/sio2 multilayers is compressive. it becomes tensile after annealing at 200 degrees c, and then the value of tensile stress increases as annealing temperature increases. and cracks appear in the film because tensile stress is too large when the sample is annealed at 400 degrees c. at the same time, the crystallite size increases and interplanar distance decreases with the increase of annealing temperature. the variation of residual stresses is corresponding with the evolution of structures. |
WOS关键词 | THIN-FILMS ; COATINGS |
WOS研究方向 | Optics |
WOS类目 | Optics |
语种 | 英语 |
出版者 | SCIENCE CHINA PRESS |
WOS记录号 | WOS:000255024700021 |
内容类型 | 期刊论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/2387091 |
专题 | 中国科学院大学 |
通讯作者 | Shen, Yanming |
作者单位 | 1.Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Shanghai 201800, Peoples R China 2.Grad Univ Chinese Acad Sci, Beijing 100049, Peoples R China 3.Henan Univ Sci & Technol, Sch Sci, Luoyang 471003, Peoples R China |
推荐引用方式 GB/T 7714 | Shen, Yanming,Han, Zhaoxia,Shao, Jianda,et al. Annealing effects on residual stress of wo2/sio2 multilayers[J]. Chinese optics letters,2008,6(3):225-227. |
APA | Shen, Yanming,Han, Zhaoxia,Shao, Jianda,Shao, Shuying,&He, Hongbo.(2008).Annealing effects on residual stress of wo2/sio2 multilayers.Chinese optics letters,6(3),225-227. |
MLA | Shen, Yanming,et al."Annealing effects on residual stress of wo2/sio2 multilayers".Chinese optics letters 6.3(2008):225-227. |
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