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	Electroless deposition of copper and fabrication of copper micropatterns on cvd diamond film surfaces
	Zhao, Jianwen1,2,3; Tian, Ruhai1,2; Zhi, Jinfang1,2
刊名	Applied surface science
	2008-03-30
卷号	254期号:11页码:3282-3287
关键词	Electroless deposition Diamond Copper micropattern Electrochemical Glucose
ISSN号	0169-4332
DOI	10.1016/j.apsusc.2007.11.008
通讯作者	Zhi, jinfang(zhi-mail@mail.ipc.ac.cn)
英文摘要	Electroless deposition of copper on as-grown and amino-modification diamond substrates was investigated. the compact and uniform copper films were successfully electrolessly deposited on as-grown and amino-modification diamond substrates after activation by pd/sn colloid nanoparticles. the adhesion interaction between copper films and diamond substrates was roughly estimated by the ultrasonic treatment. the results showed the higher adhesion interaction between copper films and amino-modification diamond substrates than that between the copper films and as-grown diamond substrates due to the greater attractive force between the pd/sn colloid nanoparticles and amino-modified diamond surface. the favorable copper micropatterns were successfully constructed on diamond film surfaces by means of the catalyst lift-off method and the copper lift-off method. furthermore, the electrochemical behavior of copper-modified boron-doped diamond (bdd) was studied for glucose oxidation in 0.2 m sodium hydroxide solution by using cyclic voltammetry, and the result indicated that copper-modified bdd exhibited high catalytic activity to electrochemical oxidation of glucose in alkaline media. (c) 2007 published by elsevier b. v.
WOS关键词	SELF-ASSEMBLED MONOLAYERS ; SITE-SELECTIVE DEPOSITION ; METAL-DEPOSITION ; METALLIZATION ; SUBSTRATE ; TEMPLATE
WOS研究方向	Chemistry ; Materials Science ; Physics
WOS类目	Chemistry, Physical ; Materials Science, Coatings & Films ; Physics, Applied ; Physics, Condensed Matter
语种	英语
出版者	ELSEVIER SCIENCE BV
WOS记录号	WOS:000254243800007
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/2386270
专题	中国科学院大学
通讯作者	Zhi, Jinfang
作者单位	1.Univ Chinese Acad Sci, Beijing 100080, Peoples R China 2.Tech Inst Phys & Chem, Lab Organ Optoelect Funct Mat & Mol Engn, Beijing 100080, Peoples R China 3.Jishou Univ, Coll Chem & Chem Engn, Jishou 416000, Hunan, Peoples R China
推荐引用方式 GB/T 7714	Zhao, Jianwen,Tian, Ruhai,Zhi, Jinfang. Electroless deposition of copper and fabrication of copper micropatterns on cvd diamond film surfaces[J]. Applied surface science,2008,254(11):3282-3287.
APA	Zhao, Jianwen,Tian, Ruhai,&Zhi, Jinfang.(2008).Electroless deposition of copper and fabrication of copper micropatterns on cvd diamond film surfaces.Applied surface science,254(11),3282-3287.
MLA	Zhao, Jianwen,et al."Electroless deposition of copper and fabrication of copper micropatterns on cvd diamond film surfaces".Applied surface science 254.11(2008):3282-3287.

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