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	Transient thermal and structural deformation and its impact on optical performance of projection optics for extreme ultraviolet lithography
	Liu, Ke; Li, Yanqiu; Zhang, Fuchang; Fan, Mingzhe
刊名	Japanese journal of applied physics part 1-regular papers brief communications & review papers
	2007-10-01
卷号	46期号:10a页码:6568-6572
关键词	Extreme ultraviolet lithography Projection optics Thermal and structural effect Mirror mount Thermo-mechanical analysis Zernike polynomials
ISSN号	0021-4922
DOI	10.1143/jjap.46.6568
通讯作者	Liu, ke()
英文摘要	For extreme ultraviolet lithography (euvl) targeting 45 nm technology generation and beyond, thermal absorption is the main source of multi layer-coated mirror structural deformation, which will finally cause degradation of lithographic performance. it becomes necessary to consider thermal absorption issue in the design phase of volume production tool. utilizing several commercial and in-house software packages, we have performed a complete transient thermo-mechanical analysis of such effects and its impact on optical performance for volume production of euvl. this article presents the simulation results based on wafer throughput model of 100 300 mm wafers per hour for the 32 nm technology generation.
WOS研究方向	Physics
WOS类目	Physics, Applied
语种	英语
出版者	INST PURE APPLIED PHYSICS
WOS记录号	WOS:000250266800019
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/2382543
专题	中国科学院大学
通讯作者	Liu, Ke
作者单位	1.Beijing Inst Technol, Beijing 100081, Peoples R China 2.Chinese Acad Sci, Inst Elect Engn, Beijing 100080, Peoples R China 3.Chinese Acad Sci, Grad Univ, Beijing 100049, Peoples R China
推荐引用方式 GB/T 7714	Liu, Ke,Li, Yanqiu,Zhang, Fuchang,et al. Transient thermal and structural deformation and its impact on optical performance of projection optics for extreme ultraviolet lithography[J]. Japanese journal of applied physics part 1-regular papers brief communications & review papers,2007,46(10a):6568-6572.
APA	Liu, Ke,Li, Yanqiu,Zhang, Fuchang,&Fan, Mingzhe.(2007).Transient thermal and structural deformation and its impact on optical performance of projection optics for extreme ultraviolet lithography.Japanese journal of applied physics part 1-regular papers brief communications & review papers,46(10a),6568-6572.
MLA	Liu, Ke,et al."Transient thermal and structural deformation and its impact on optical performance of projection optics for extreme ultraviolet lithography".Japanese journal of applied physics part 1-regular papers brief communications & review papers 46.10a(2007):6568-6572.

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