Nano-structure in micro-crystalline silicon thin films studied by small-angle x-ray scattering | |
Zhou, BQ; Liu, FZ; Gu, JH; Zhang, QF; Zhou, YQ; Zhu, MF | |
刊名 | Thin solid films
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2006-04-20 | |
卷号 | 501期号:1-2页码:113-116 |
关键词 | Micro-crystalline si Thin film Nano-structure Saxs |
ISSN号 | 0040-6090 |
DOI | 10.1016/j.tsf.2005.07.135 |
通讯作者 | Liu, fz() |
英文摘要 | Hydrogenated micro-crystalline silicon (pe-si:h) thin films, with similar crystalline volume fraction (xc) and deposition rate (r-d), were prepared by hot-wire chemical vapor deposition (hwcvd), rf plasma-enhanced cvd (pecvd), plasma-assisted hwcvd (p-hwcvd) and two-step hydrogen dilution (s-h) hwcvd. the influence of plasma and two-step sh on nano-structure of mu c-si:h films was studied by using synchrotron radiation small-angle x-ray scattering (saxs) combined with fourier transform infrared spectroscopy (ftir) and flotation density measurement. compared with the hwcvd sample, the void fraction and mean size of micro-voids were reduced by plasma and two-step s-h. the anisotropic growth character was detected in mu c-si:h films. (c) 2005 elsevier b.v. all rights reserved. |
WOS关键词 | DEPOSITION ; SI ; GROWTH |
WOS研究方向 | Materials Science ; Physics |
WOS类目 | Materials Science, Multidisciplinary ; Materials Science, Coatings & Films ; Physics, Applied ; Physics, Condensed Matter |
语种 | 英语 |
出版者 | ELSEVIER SCIENCE SA |
WOS记录号 | WOS:000235979600027 |
内容类型 | 期刊论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/2378821 |
专题 | 中国科学院大学 |
通讯作者 | Liu, FZ |
作者单位 | Chinese Acad Sci, Coll Phys Sci, Grad Sch, Beijing 100049, Peoples R China |
推荐引用方式 GB/T 7714 | Zhou, BQ,Liu, FZ,Gu, JH,et al. Nano-structure in micro-crystalline silicon thin films studied by small-angle x-ray scattering[J]. Thin solid films,2006,501(1-2):113-116. |
APA | Zhou, BQ,Liu, FZ,Gu, JH,Zhang, QF,Zhou, YQ,&Zhu, MF.(2006).Nano-structure in micro-crystalline silicon thin films studied by small-angle x-ray scattering.Thin solid films,501(1-2),113-116. |
MLA | Zhou, BQ,et al."Nano-structure in micro-crystalline silicon thin films studied by small-angle x-ray scattering".Thin solid films 501.1-2(2006):113-116. |
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