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	Nano-structure in micro-crystalline silicon thin films studied by small-angle x-ray scattering
	Zhou, BQ; Liu, FZ; Gu, JH; Zhang, QF; Zhou, YQ; Zhu, MF
刊名	Thin solid films
	2006-04-20
卷号	501期号:1-2页码:113-116
关键词	Micro-crystalline si Thin film Nano-structure Saxs
ISSN号	0040-6090
DOI	10.1016/j.tsf.2005.07.135
通讯作者	Liu, fz()
英文摘要	Hydrogenated micro-crystalline silicon (pe-si:h) thin films, with similar crystalline volume fraction (xc) and deposition rate (r-d), were prepared by hot-wire chemical vapor deposition (hwcvd), rf plasma-enhanced cvd (pecvd), plasma-assisted hwcvd (p-hwcvd) and two-step hydrogen dilution (s-h) hwcvd. the influence of plasma and two-step sh on nano-structure of mu c-si:h films was studied by using synchrotron radiation small-angle x-ray scattering (saxs) combined with fourier transform infrared spectroscopy (ftir) and flotation density measurement. compared with the hwcvd sample, the void fraction and mean size of micro-voids were reduced by plasma and two-step s-h. the anisotropic growth character was detected in mu c-si:h films. (c) 2005 elsevier b.v. all rights reserved.
WOS关键词	DEPOSITION ; SI ; GROWTH
WOS研究方向	Materials Science ; Physics
WOS类目	Materials Science, Multidisciplinary ; Materials Science, Coatings & Films ; Physics, Applied ; Physics, Condensed Matter
语种	英语
出版者	ELSEVIER SCIENCE SA
WOS记录号	WOS:000235979600027
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/2378821
专题	中国科学院大学
通讯作者	Liu, FZ
作者单位	Chinese Acad Sci, Coll Phys Sci, Grad Sch, Beijing 100049, Peoples R China
推荐引用方式 GB/T 7714	Zhou, BQ,Liu, FZ,Gu, JH,et al. Nano-structure in micro-crystalline silicon thin films studied by small-angle x-ray scattering[J]. Thin solid films,2006,501(1-2):113-116.
APA	Zhou, BQ,Liu, FZ,Gu, JH,Zhang, QF,Zhou, YQ,&Zhu, MF.(2006).Nano-structure in micro-crystalline silicon thin films studied by small-angle x-ray scattering.Thin solid films,501(1-2),113-116.
MLA	Zhou, BQ,et al."Nano-structure in micro-crystalline silicon thin films studied by small-angle x-ray scattering".Thin solid films 501.1-2(2006):113-116.

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