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	Design of phase-shifting masks for enhancing resolution of images in optical lithography
	Li, ZY; Yang, GZ; Dong, BZ; Gu, BY; Zhang, GQ
刊名	Optik
	1998
卷号	108期号:4页码:165-173
ISSN号	0030-4026
通讯作者	Li, zy()
英文摘要	The problem of optimal design of phase-shifting masks for enhancing resolution of images in optical lithography is examined based on the general theory of amplitude-phase retrieval in coherent optical system. we propose a practical algorithm used for the design of phase-shifting masks. to illustrate the new approach the numerical simulation designs of the phase-shifting mask are carried out for several mode images, for instance, one-dimensional (1-d) equal-spacing lines and two-dimensional (2-d) model patterns. we find that for 1-d model images, the optimal phase distributions are automatically taken binary values, 0 and pi, between the consecutive lines. for the 2-d model images, the complicated contructions contained in the object patterns can be resolved very well by using the designed phase-shifting mask. in the new approach the phase modulation in the masks is required to encode only the clear regions of object patterns. therefore, the new approach may provide an effective scheme for implementing systematic optimal design of phase-shifting masks used for real integrated circuit lithography.
WOS关键词	PHOTOLITHOGRAPHY ; AMPLITUDE ; RETRIEVAL ; SYSTEM ; PLANE
WOS研究方向	Optics
WOS类目	Optics
语种	英语
出版者	GUSTAV FISCHER VERLAG
WOS记录号	WOS:000074685200003
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/2373827
专题	物理研究所
通讯作者	Li, ZY
作者单位	Acad Sinica, Inst Phys, Beijing 100080, Peoples R China
推荐引用方式 GB/T 7714	Li, ZY,Yang, GZ,Dong, BZ,et al. Design of phase-shifting masks for enhancing resolution of images in optical lithography[J]. Optik,1998,108(4):165-173.
APA	Li, ZY,Yang, GZ,Dong, BZ,Gu, BY,&Zhang, GQ.(1998).Design of phase-shifting masks for enhancing resolution of images in optical lithography.Optik,108(4),165-173.
MLA	Li, ZY,et al."Design of phase-shifting masks for enhancing resolution of images in optical lithography".Optik 108.4(1998):165-173.

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