Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity

	Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
	Zhu, Yafeng; Rong Huang(黄荣); Tong Liu(刘通); Zhao, Yanfei(赵弇斐); Yang Shen(沈阳); Jian Zhang(张鉴); An Dingsun(丁孙安); Yun Guo; Li, Fangsen(李坊森)
刊名	JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
	2018
其他题名	Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
语种	英语
内容类型	期刊论文
源URL	[http://ir.sinano.ac.cn/handle/332007/6212]
专题	苏州纳米技术与纳米仿生研究所_大科学装置
作者单位	中国科学院苏州纳米技术与纳米仿生研究所
推荐引用方式 GB/T 7714	Zhu, Yafeng,Rong Huang,Tong Liu,et al. Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A,2018.
APA	Zhu, Yafeng.,Rong Huang.,Tong Liu.,Zhao, Yanfei.,Yang Shen.,...&Li, Fangsen.(2018).Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A.
MLA	Zhu, Yafeng,et al."Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity".JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2018).