The influence of thermal annealing process after GaN cap layer growth on structural and optical properties of InGaN/InGaN multi-quantum wells
Yang, J.; Liu, S.T.; Du, G.T.; Zhang, Y.T.; Li, M.; Wang, W.J.; Zhang, L.Q.(张立群); Peng, L.Y.; Xing, Y.; Liu, W.
刊名Optical Materials
2018
其他题名The influence of thermal annealing process after GaN cap layer growth on structural and optical properties of InGaN/InGaN multi-quantum wells
语种英语
内容类型期刊论文
源URL[http://ir.sinano.ac.cn/handle/332007/6184]  
专题苏州纳米技术与纳米仿生研究所_纳米器件及相关材料研究部_刘建平团队
作者单位中国科学院苏州纳米技术与纳米仿生研究所
推荐引用方式
GB/T 7714
Yang, J.,Liu, S.T.,Du, G.T.,et al. The influence of thermal annealing process after GaN cap layer growth on structural and optical properties of InGaN/InGaN multi-quantum wells[J]. Optical Materials,2018.
APA Yang, J..,Liu, S.T..,Du, G.T..,Zhang, Y.T..,Li, M..,...&Zhao, D.G..(2018).The influence of thermal annealing process after GaN cap layer growth on structural and optical properties of InGaN/InGaN multi-quantum wells.Optical Materials.
MLA Yang, J.,et al."The influence of thermal annealing process after GaN cap layer growth on structural and optical properties of InGaN/InGaN multi-quantum wells".Optical Materials (2018).
个性服务
查看访问统计
相关权益政策
暂无数据
收藏/分享
所有评论 (0)
暂无评论
 

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。


©版权所有 ©2017 CSpace - Powered by CSpace