Slurry preparation: a key to upgrade CMP efficiency | |
Zhang, Chao-Hui[1]; Lei, Hong[2]; Hu, Xiao-Li[3] | |
2011 | |
会议名称 | International Conference on Advances in Materials and Manufacturing Processes |
会议日期 | 2010-11-06 |
关键词 | slurry preparation chemical mechanical planarization material removal ratio |
页码 | 19-+ |
URL标识 | 查看原文 |
内容类型 | 会议论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/2306205 |
专题 | 上海大学 |
作者单位 | [1]School of Mechanical, Electronic and Control Engineering, Beijing Jiaotong University, Beijing 100044, China [2]Research Center of Nano-Science and Nano-Technology, Shanghai University, Shanghai 200436, China [3]Shanghai Dianji University, Shanghai 200245, China |
推荐引用方式 GB/T 7714 | Zhang, Chao-Hui[1],Lei, Hong[2],Hu, Xiao-Li[3]. Slurry preparation: a key to upgrade CMP efficiency[C]. 见:International Conference on Advances in Materials and Manufacturing Processes. 2010-11-06. |
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