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Slurry preparation: a key to upgrade CMP efficiency
Zhang, Chao-Hui[1]; Lei, Hong[2]; Hu, Xiao-Li[3]
2011
会议名称International Conference on Advances in Materials and Manufacturing Processes
会议日期2010-11-06
关键词slurry preparation chemical mechanical planarization material removal ratio
页码19-+
URL标识查看原文
内容类型会议论文
URI标识http://www.corc.org.cn/handle/1471x/2306205
专题上海大学
作者单位[1]School of Mechanical, Electronic and Control Engineering, Beijing Jiaotong University, Beijing 100044, China [2]Research Center of Nano-Science and Nano-Technology, Shanghai University, Shanghai 200436, China [3]Shanghai Dianji University, Shanghai 200245, China
推荐引用方式
GB/T 7714
Zhang, Chao-Hui[1],Lei, Hong[2],Hu, Xiao-Li[3]. Slurry preparation: a key to upgrade CMP efficiency[C]. 见:International Conference on Advances in Materials and Manufacturing Processes. 2010-11-06.
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