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	Effect of deposition temperature on surface roughness of nanocrystalline diamond film
	Dai, Wenqi[1]; Wang, Linjun[2]; Huang, Jian[3]; Liu, Yifeng[4]; Tang, Ke[5]; Xia, Yiben[6]
	2012
会议名称	NEW MATERIALS AND PROCESSES, PTS 1-3
会议日期	2012-03-27
关键词	diamond film surface roughness chemical vapor deposition
页码	2353-2356
URL标识	查看原文
内容类型	会议论文
URI标识	http://www.corc.org.cn/handle/1471x/2298560
专题	上海大学
作者单位	1.[1]Shanghai Univ, Sch Mat Sci & Engn, Shanghai 200072, Peoples R China. 2.[2]Shanghai Univ, Sch Mat Sci & Engn, Shanghai 200072, Peoples R China. 3.[3]Shanghai Univ, Sch Mat Sci & Engn, Shanghai 200072, Peoples R China. 4.[4]Shanghai Univ, Sch Mat Sci & Engn, Shanghai 200072, Peoples R China. 5.[5]Shanghai Univ, Sch Mat Sci & Engn, Shanghai 200072, Peoples R China. 6.[6]Shanghai Univ, Sch Mat Sci & Engn, Shanghai 200072, Peoples R China.
推荐引用方式 GB/T 7714	Dai, Wenqi[1],Wang, Linjun[2],Huang, Jian[3],et al. Effect of deposition temperature on surface roughness of nanocrystalline diamond film[C]. 见:NEW MATERIALS AND PROCESSES, PTS 1-3. 2012-03-27.

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