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Modeling, fabrication and measurement of a novel CMOS UV/blue-extended photodiode
Chen Chang-ping[1]; Zhao Yong-jia[2]; Zhou Xiao-ya[3]; Jin Xiang-liang[4]; Yang Hong-jiao[5]; Luo Jun[6]
刊名JOURNAL OF CENTRAL SOUTH UNIVERSITY
2014
卷号21页码:3821-3827
关键词device simulation numerical modeling ultraviolet responsivity photoelectric characteristics avalanche breakdown voltage silicon
ISSN号2095-2899
URL标识查看原文
内容类型期刊论文
URI标识http://www.corc.org.cn/handle/1471x/2280870
专题上海大学
作者单位1.[1]Xiangtan Univ, Fac Mat Optoelect & Phys, Xiangtan 411105, Peoples R China.
2.[2]Xiangtan Univ, Fac Mat Optoelect & Phys, Xiangtan 411105, Peoples R China.
3.[3]Xiangtan Univ, Fac Mat Optoelect & Phys, Xiangtan 411105, Peoples R China.
4.[4]Xiangtan Univ, Fac Mat Optoelect & Phys, Xiangtan 411105, Peoples R China.
5.[5]Xiangtan Univ, Fac Mat Optoelect & Phys, Xiangtan 411105, Peoples R China.
6.[6]Shanghai Univ, Sch Mechatron Engn & Automat, Shanghai 200444, Peoples R China.
推荐引用方式
GB/T 7714
Chen Chang-ping[1],Zhao Yong-jia[2],Zhou Xiao-ya[3],et al. Modeling, fabrication and measurement of a novel CMOS UV/blue-extended photodiode[J]. JOURNAL OF CENTRAL SOUTH UNIVERSITY,2014,21:3821-3827.
APA Chen Chang-ping[1],Zhao Yong-jia[2],Zhou Xiao-ya[3],Jin Xiang-liang[4],Yang Hong-jiao[5],&Luo Jun[6].(2014).Modeling, fabrication and measurement of a novel CMOS UV/blue-extended photodiode.JOURNAL OF CENTRAL SOUTH UNIVERSITY,21,3821-3827.
MLA Chen Chang-ping[1],et al."Modeling, fabrication and measurement of a novel CMOS UV/blue-extended photodiode".JOURNAL OF CENTRAL SOUTH UNIVERSITY 21(2014):3821-3827.
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