N-2/Ar flow ratio process on the structures and properties enhancement of LiPON film lithium cells | |
Ji, Xin[1]; Wang, Lin Jun[2]; Mi, Yi Ming[3]; Zhang, Chao Min[4] | |
刊名 | OPTOELECTRONICS AND ADVANCED MATERIALS-RAPID COMMUNICATIONS |
2015 | |
卷号 | 9页码:1458-1461 |
关键词 | Lipon film Flow ratio Reaction deposition Electrochemical properties |
ISSN号 | 1842-6573 |
URL标识 | 查看原文 |
内容类型 | 期刊论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/2239125 |
专题 | 上海大学 |
作者单位 | 1.[1]Shanghai Univ, Sch Mat Sci & Engn, Shanghai 200444, Peoples R China. 2.[2]Shanghai Univ, Sch Mat Sci & Engn, Shanghai 200444, Peoples R China. 3.[3]Shanghai Univ Engn Sci, Coll Fundamental Studies, Shanghai 201620, Peoples R China. 4.[4]Shanghai Univ Engn Sci, Coll Fundamental Studies, Shanghai 201620, Peoples R China. |
推荐引用方式 GB/T 7714 | Ji, Xin[1],Wang, Lin Jun[2],Mi, Yi Ming[3],et al. N-2/Ar flow ratio process on the structures and properties enhancement of LiPON film lithium cells[J]. OPTOELECTRONICS AND ADVANCED MATERIALS-RAPID COMMUNICATIONS,2015,9:1458-1461. |
APA | Ji, Xin[1],Wang, Lin Jun[2],Mi, Yi Ming[3],&Zhang, Chao Min[4].(2015).N-2/Ar flow ratio process on the structures and properties enhancement of LiPON film lithium cells.OPTOELECTRONICS AND ADVANCED MATERIALS-RAPID COMMUNICATIONS,9,1458-1461. |
MLA | Ji, Xin[1],et al."N-2/Ar flow ratio process on the structures and properties enhancement of LiPON film lithium cells".OPTOELECTRONICS AND ADVANCED MATERIALS-RAPID COMMUNICATIONS 9(2015):1458-1461. |
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