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	Effect of substrate choosing process on the structures and radiation-proof properties of Al films
	Ji, Xin[1]; Wang, Lin Jun[2]; Mi, Yi Ming[3]; Zhang, Chao Min[4]
刊名	OPTOELECTRONICS AND ADVANCED MATERIALS-RAPID COMMUNICATIONS
	2015
卷号	9页码:688-691
关键词	Thin film Al Substrate choosing process Vapor deposition Radiation-proof properties
ISSN号	1842-6573
URL标识	查看原文
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/2239082
专题	上海大学
作者单位	1.[1]Shanghai Univ, Sch Mat Sci & Engn, Shanghai 200444, Peoples R China. 2.[2]Shanghai Univ, Sch Mat Sci & Engn, Shanghai 200444, Peoples R China. 3.[3]Shanghai Univ Engn Sci, Coll Fundamental Studies, Shanghai 201620, Peoples R China. 4.[4]Shanghai Univ Engn Sci, Coll Fundamental Studies, Shanghai 201620, Peoples R China.
推荐引用方式 GB/T 7714	Ji, Xin[1],Wang, Lin Jun[2],Mi, Yi Ming[3],et al. Effect of substrate choosing process on the structures and radiation-proof properties of Al films[J]. OPTOELECTRONICS AND ADVANCED MATERIALS-RAPID COMMUNICATIONS,2015,9:688-691.
APA	Ji, Xin[1],Wang, Lin Jun[2],Mi, Yi Ming[3],&Zhang, Chao Min[4].(2015).Effect of substrate choosing process on the structures and radiation-proof properties of Al films.OPTOELECTRONICS AND ADVANCED MATERIALS-RAPID COMMUNICATIONS,9,688-691.
MLA	Ji, Xin[1],et al."Effect of substrate choosing process on the structures and radiation-proof properties of Al films".OPTOELECTRONICS AND ADVANCED MATERIALS-RAPID COMMUNICATIONS 9(2015):688-691.

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