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	Preparation of Ce-doped colloidal SiO2 composite abrasives and their chemical mechanical polishing behavior on sapphire substrates
	Lei, Hong[1]; Tong, Kaiyu[2]; Wang, Zhanyong[3]
刊名	MATERIALS CHEMISTRY AND PHYSICS
	2016
卷号	172页码:26-31
关键词	Composite materials Chemical synthesis Surfaces X-ray photo-emission spectroscopy (XPS)
ISSN号	0254-0584
URL标识	查看原文
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/2235978
专题	上海大学
作者单位	1.[1]Shanghai Inst Technol, Sch Mat Sci & Engn, Shanghai 201418, Peoples R China. 2.Shanghai Univ, Res Ctr Nanosci & Nanotechnol, Shanghai 200444, Peoples R China. 3.[2]Shanghai Inst Technol, Sch Mat Sci & Engn, Shanghai 201418, Peoples R China. 4.[3]Shanghai Inst Technol, Sch Mat Sci & Engn, Shanghai 201418, Peoples R China.
推荐引用方式 GB/T 7714	Lei, Hong[1],Tong, Kaiyu[2],Wang, Zhanyong[3]. Preparation of Ce-doped colloidal SiO2 composite abrasives and their chemical mechanical polishing behavior on sapphire substrates[J]. MATERIALS CHEMISTRY AND PHYSICS,2016,172:26-31.
APA	Lei, Hong[1],Tong, Kaiyu[2],&Wang, Zhanyong[3].(2016).Preparation of Ce-doped colloidal SiO2 composite abrasives and their chemical mechanical polishing behavior on sapphire substrates.MATERIALS CHEMISTRY AND PHYSICS,172,26-31.
MLA	Lei, Hong[1],et al."Preparation of Ce-doped colloidal SiO2 composite abrasives and their chemical mechanical polishing behavior on sapphire substrates".MATERIALS CHEMISTRY AND PHYSICS 172(2016):26-31.

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