The effect of Ar plasma etching time on the microstructure, optical and photoelectric properties of CdZnTe films | |
Zhang, Yuelu[1]; Huang, Jian[2]; Zhang, Jijun[3]; Mou, Qun[4]; Shen, Yue[5]; Wang, Linjun[6] | |
刊名 | SURFACE & COATINGS TECHNOLOGY
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2016 | |
卷号 | 296页码:104-107 |
关键词 | CdZnTe film Plasma etching Surface treatment Close-spaced sublimation |
ISSN号 | 0257-8972 |
URL标识 | 查看原文 |
内容类型 | 期刊论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/2233276 |
专题 | 上海大学 |
作者单位 | 1.[1]Shanghai Univ, Sch Mat Sci & Engn, Shanghai 200444, Peoples R China. 2.[2]Shanghai Univ, Sch Mat Sci & Engn, Shanghai 200444, Peoples R China. 3.[3]Shanghai Univ, Sch Mat Sci & Engn, Shanghai 200444, Peoples R China. 4.[4]Shanghai Univ, Sch Mat Sci & Engn, Shanghai 200444, Peoples R China. 5.[5]Shanghai Univ, Sch Mat Sci & Engn, Shanghai 200444, Peoples R China. 6.[6]Shanghai Univ, Sch Mat Sci & Engn, Shanghai 200444, Peoples R China. |
推荐引用方式 GB/T 7714 | Zhang, Yuelu[1],Huang, Jian[2],Zhang, Jijun[3],et al. The effect of Ar plasma etching time on the microstructure, optical and photoelectric properties of CdZnTe films[J]. SURFACE & COATINGS TECHNOLOGY,2016,296:104-107. |
APA | Zhang, Yuelu[1],Huang, Jian[2],Zhang, Jijun[3],Mou, Qun[4],Shen, Yue[5],&Wang, Linjun[6].(2016).The effect of Ar plasma etching time on the microstructure, optical and photoelectric properties of CdZnTe films.SURFACE & COATINGS TECHNOLOGY,296,104-107. |
MLA | Zhang, Yuelu[1],et al."The effect of Ar plasma etching time on the microstructure, optical and photoelectric properties of CdZnTe films".SURFACE & COATINGS TECHNOLOGY 296(2016):104-107. |
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