Calibration method for mask grating mark imaging in lithography alignment (EI收录) | |
Zhu, Jiangping[1,2,3]; Hu, Song[1]; Yu, Junsheng[2]; Tang, Yan[1]; Zhou, Shaolin[4]; He, Yu[1,3] | |
刊名 | Zhongguo Jiguang/Chinese Journal of Lasers
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2013 | |
卷号 | 40 |
关键词 | Alignment Diffraction gratings |
URL标识 | 查看原文 |
内容类型 | 期刊论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/2221261 |
专题 | 华南理工大学 |
作者单位 | 1.[1] Institution of Optics and Electronics, Chinese Academy of Sciences, Chengdu, Sichuan 610209, China 2.[2] School of Optoelectronic Information, University of Electronic Science and Technology of China, Chengdu, Sichuan 610054, China 3.[3] University of Chinese Academy of Sciences, Beijing 100049, China 4.[4] School of Electronic and Information, South China University of Technology, Guangzhou, Guangdong 510540, China |
推荐引用方式 GB/T 7714 | Zhu, Jiangping[1,2,3],Hu, Song[1],Yu, Junsheng[2],等. Calibration method for mask grating mark imaging in lithography alignment (EI收录)[J]. Zhongguo Jiguang/Chinese Journal of Lasers,2013,40. |
APA | Zhu, Jiangping[1,2,3],Hu, Song[1],Yu, Junsheng[2],Tang, Yan[1],Zhou, Shaolin[4],&He, Yu[1,3].(2013).Calibration method for mask grating mark imaging in lithography alignment (EI收录).Zhongguo Jiguang/Chinese Journal of Lasers,40. |
MLA | Zhu, Jiangping[1,2,3],et al."Calibration method for mask grating mark imaging in lithography alignment (EI收录)".Zhongguo Jiguang/Chinese Journal of Lasers 40(2013). |
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