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	Calibration method for mask grating mark imaging in lithography alignment (EI收录)
	Zhu, Jiangping[1,2,3]; Hu, Song[1]; Yu, Junsheng[2]; Tang, Yan[1]; Zhou, Shaolin[4]; He, Yu[1,3]
刊名	Zhongguo Jiguang/Chinese Journal of Lasers
	2013
卷号	40
关键词	Alignment Diffraction gratings
URL标识	查看原文
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/2221261
专题	华南理工大学
作者单位	1.[1] Institution of Optics and Electronics, Chinese Academy of Sciences, Chengdu, Sichuan 610209, China 2.[2] School of Optoelectronic Information, University of Electronic Science and Technology of China, Chengdu, Sichuan 610054, China 3.[3] University of Chinese Academy of Sciences, Beijing 100049, China 4.[4] School of Electronic and Information, South China University of Technology, Guangzhou, Guangdong 510540, China
推荐引用方式 GB/T 7714	Zhu, Jiangping[1,2,3],Hu, Song[1],Yu, Junsheng[2],等. Calibration method for mask grating mark imaging in lithography alignment (EI收录)[J]. Zhongguo Jiguang/Chinese Journal of Lasers,2013,40.
APA	Zhu, Jiangping[1,2,3],Hu, Song[1],Yu, Junsheng[2],Tang, Yan[1],Zhou, Shaolin[4],&He, Yu[1,3].(2013).Calibration method for mask grating mark imaging in lithography alignment (EI收录).Zhongguo Jiguang/Chinese Journal of Lasers,40.
MLA	Zhu, Jiangping[1,2,3],et al."Calibration method for mask grating mark imaging in lithography alignment (EI收录)".Zhongguo Jiguang/Chinese Journal of Lasers 40(2013).

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