Fabrication and characteristics of high-performance and high-stability aluminum-doped zinc oxide thin-film transistors (EI收录SCI收录) | |
Shan, Dongfang[1,2]; Han, Dedong[1]; Huang, Fuqing[1,2]; Tian, Yu[1]; Zhang, Suoming[1,2]; Qi, Lin[1,2]; Cong, Yingying[1]; Zhang, Shengdong[1,2]; Zhang, Xing[1]; Wang, Yi[1] | |
刊名 | JAPANESE JOURNAL OF APPLIED PHYSICS
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2014 | |
卷号 | 53 |
URL标识 | 查看原文 |
内容类型 | 期刊论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/2216556 |
专题 | 华南理工大学 |
作者单位 | 1.[1]Peking Univ, Inst Microelect, Beijing 100871, Peoples R China 2.[2]Peking Univ, Shenzhen Grad Sch, Shenzhen 518055, Peoples R China |
推荐引用方式 GB/T 7714 | Shan, Dongfang[1,2],Han, Dedong[1],Huang, Fuqing[1,2],等. Fabrication and characteristics of high-performance and high-stability aluminum-doped zinc oxide thin-film transistors (EI收录SCI收录)[J]. JAPANESE JOURNAL OF APPLIED PHYSICS,2014,53. |
APA | Shan, Dongfang[1,2].,Han, Dedong[1].,Huang, Fuqing[1,2].,Tian, Yu[1].,Zhang, Suoming[1,2].,...&Wang, Yi[1].(2014).Fabrication and characteristics of high-performance and high-stability aluminum-doped zinc oxide thin-film transistors (EI收录SCI收录).JAPANESE JOURNAL OF APPLIED PHYSICS,53. |
MLA | Shan, Dongfang[1,2],et al."Fabrication and characteristics of high-performance and high-stability aluminum-doped zinc oxide thin-film transistors (EI收录SCI收录)".JAPANESE JOURNAL OF APPLIED PHYSICS 53(2014). |
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